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非化学计量比的SrTiO热电材料中由还原氧化石墨烯控制的晶界界面

Grain Boundary Interfaces Controlled by Reduced Graphene Oxide in Nonstoichiometric SrTiO Thermoelectrics.

作者信息

Rahman Jamil Ur, Du Nguyen Van, Nam Woo Hyun, Shin Weon Ho, Lee Kyu Hyoung, Seo Won-Seon, Kim Myong Ho, Lee Soonil

机构信息

Energy & Environmental Materials Division, Korea Institute of Ceramic Engineering & Technology, Jinju, 52861, South Korea.

School of Materials Science and Engineering, Changwon National University, Changwon, 51140, South Korea.

出版信息

Sci Rep. 2019 Jun 13;9(1):8624. doi: 10.1038/s41598-019-45162-7.

Abstract

Point defect or doping in Strontium titanium oxide (STO) largely determines the thermoelectric (TE) properties. So far, insufficient knowledge exists on the impact of double Schottky barrier on the TE performance. Herein, we report a drastic effect of double Schottky barrier on the TE performance in undoped STO. It demonstrates that incorporation of Reduced Graphene Oxide (RGO) into undoped STO weakens the double Schottky barrier and thereby results in a simultaneous increase in both carrier concentration and mobility of undoped STO. The enhanced mobility exhibits single crystal-like behavior. This increase in the carrier concentration and mobility boosts the electrical conductivity and power factor of undoped STO, which is attributed to the reduction of the double Schottky barrier height and/or the band alignment of STO and RGO that allow the charge transfer through the interface at grain boundaries. Furthermore, this STO/RGO interface also enhances the phonon scattering, which results in low thermal conductivity. This strategy significantly increases the ratio of σ/κ, resulting in an enhancement in ZT as compared with pure undoped STO. This study opens a new window to optimize the TE properties of many candidate materials.

摘要

钛酸锶(STO)中的点缺陷或掺杂在很大程度上决定了其热电(TE)性能。到目前为止,关于双肖特基势垒对TE性能的影响,人们了解得还不够充分。在此,我们报道了双肖特基势垒对未掺杂STO的TE性能的显著影响。结果表明,将还原氧化石墨烯(RGO)掺入未掺杂的STO中会削弱双肖特基势垒,从而导致未掺杂STO的载流子浓度和迁移率同时增加。增强的迁移率表现出类似单晶的行为。载流子浓度和迁移率的这种增加提高了未掺杂STO的电导率和功率因数,这归因于双肖特基势垒高度的降低和/或STO与RGO的能带排列,使得电荷能够通过晶界处的界面进行转移。此外,这种STO/RGO界面还增强了声子散射,从而导致低热导率。该策略显著提高了σ/κ的比值,与纯未掺杂STO相比,ZT得到了增强。这项研究为优化许多候选材料的TE性能打开了一扇新窗口。

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