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通过二氧化碳选择性蚀刻非晶碳实现大面积超清洁石墨烯的合成

Large-Area Synthesis of Superclean Graphene via Selective Etching of Amorphous Carbon with Carbon Dioxide.

作者信息

Zhang Jincan, Jia Kaicheng, Lin Li, Zhao Wei, Quang Huy Ta, Sun Luzhao, Li Tianran, Li Zhenzhu, Liu Xiaoting, Zheng Liming, Xue Ruiwen, Gao Jing, Luo Zhengtang, Rummeli Mark H, Yuan Qinghong, Peng Hailin, Liu Zhongfan

机构信息

Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.

Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.

出版信息

Angew Chem Int Ed Engl. 2019 Oct 7;58(41):14446-14451. doi: 10.1002/anie.201905672. Epub 2019 Aug 7.

DOI:10.1002/anie.201905672
PMID:31286615
Abstract

Contamination commonly observed on the graphene surface is detrimental to its excellent properties and strongly hinders its application. It is still a great challenge to produce large-area clean graphene film in a low-cost manner. Herein, we demonstrate a facile and scalable chemical vapor deposition approach to synthesize meter-sized samples of superclean graphene with an average cleanness of 99 %, relying on the weak oxidizing ability of CO to etch away the intrinsic contamination, i.e., amorphous carbon. Remarkably, the elimination of amorphous carbon enables a significant reduction of polymer residues in the transfer of graphene films and the fabrication of graphene-based devices and promises strongly enhanced electrical and optical properties of graphene. The facile synthesis of large-area superclean graphene would open the pathway for both fundamental research and industrial applications of graphene, where a clean surface is highly needed.

摘要

石墨烯表面常见的污染不利于其优异性能,并严重阻碍其应用。以低成本方式制备大面积清洁石墨烯薄膜仍然是一个巨大挑战。在此,我们展示了一种简便且可扩展的化学气相沉积方法,依靠一氧化碳的弱氧化能力蚀刻掉固有污染物(即无定形碳),来合成平均洁净度达99%的米级超清洁石墨烯样品。值得注意的是,无定形碳的去除能够显著减少石墨烯薄膜转移过程中聚合物残留物,并有利于基于石墨烯的器件制造,同时有望大幅增强石墨烯的电学和光学性能。大面积超清洁石墨烯的简便合成将为石墨烯的基础研究和工业应用开辟道路,而这些领域都迫切需要清洁的表面。

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