Moghanloo Maryam, Iranbakhsh Alireza, Ebadi Mostafa, Oraghi Ardebili Zahra
1Department of Biology, Science and Research Branch, Islamic Azad University, Tehran, Iran.
Department of Biology, Damghan Branch, Islamic Azad University, Damghan, Iran.
3 Biotech. 2019 Jul;9(7):288. doi: 10.1007/s13205-019-1822-5. Epub 2019 Jun 27.
Seed priming with cold plasma in combination with manipulation of culture medium with silica nanoparticle provokes anatomical, physiological and molecular changes, thereby reinforcing the plant growth and protection.
This study addressed responses of to seed priming with cold plasma (0.84 W/cm; 0, 30, 60, and 90 s) and applications of SiO nanoparticle (nSi; 0, 5, 40, and 80 mgl) in culture medium (an in vitro study). FE-SEM confirmed nSi uptake and translocation. Bulk Si at high concentrations reduced biomass accumulation (mean = 45%), while nSi did not make significant differences. The growth-enhancing effects of plasma by 41.5% were promoted by the nSi supplementation and reached 71%. Plasma did not make significant changes in Chla, while led to the slightly higher (mean = 14%) Chlb. The presence of nSi at high doses caused slight reductions in Chlb (mean = 25%) which were mitigated by plasma. The plasma and/or nSi treatments modified activities of phenylalanine ammonia lyase (PAL) in both roots (mean = 32%) and leaves (mean = 44%). With a similar trend, both individual and combined treatments of plasma and nSi provoked inductions in peroxidase activities in roots and leaves. The simultaneous treatments of plasma and nSi had the highest expression rates of PAL gene. The individual treatments of plasma did not make a significant difference in the expression of universal stress protein (USP) gene, whereas the nSi-treated seedlings exhibited the higher expression rates of USP. Leaf thicknesses and development of the vascular system (xylem and phloem) were reinforced in response to plasma and nSi. The findings provide evidence on potential benefits and phytotoxicity of nSi and plasma which may be employed as a theoretical basis for possible exploitation.
冷等离子体引发种子引发并结合用二氧化硅纳米颗粒处理培养基,会引起解剖学、生理学和分子变化,从而促进植物生长和保护。
本研究探讨了(体外研究)冷等离子体(0.84 W/cm;0、30、60和90秒)引发种子以及在培养基中施用二氧化硅纳米颗粒(nSi;0、5、40和80 mg/L)的响应。场发射扫描电子显微镜(FE-SEM)证实了nSi的吸收和转运。高浓度的大量硅降低了生物量积累(平均值=45%),而nSi没有显著差异。nSi补充促进了等离子体41.5%的生长促进作用,达到了71%。等离子体对叶绿素a没有显著变化,而导致叶绿素b略有升高(平均值=14%)。高剂量nSi的存在导致叶绿素b略有降低(平均值=25%),而等离子体减轻了这种降低。等离子体和/或nSi处理改变了根(平均值=32%)和叶(平均值=44%)中苯丙氨酸解氨酶(PAL)的活性。等离子体和nSi的单独及联合处理都引发了根和叶中过氧化物酶活性的诱导,趋势相似。等离子体和nSi的同时处理具有最高的PAL基因表达率。等离子体的单独处理对普遍应激蛋白(USP)基因的表达没有显著差异,而nSi处理的幼苗表现出更高的USP表达率。响应等离子体和nSi,叶片厚度和维管系统(木质部和韧皮部)的发育得到增强。这些发现为nSi和等离子体的潜在益处和植物毒性提供了证据,可为可能的开发利用提供理论基础。