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光激发单层二硫化钼中带隙重整化的直接测定

Direct Determination of Band-Gap Renormalization in the Photoexcited Monolayer MoS_{2}.

作者信息

Liu Fang, Ziffer Mark E, Hansen Kameron R, Wang Jue, Zhu Xiaoyang

机构信息

Department of Chemistry, Columbia University, New York, New York 10027, USA.

出版信息

Phys Rev Lett. 2019 Jun 21;122(24):246803. doi: 10.1103/PhysRevLett.122.246803.

Abstract

A key feature of monolayer semiconductors, such as transition-metal dichalcogenides, is the poorly screened Coulomb potential, which leads to a large exciton binding energy (E_{b}) and strong renormalization of the quasiparticle band gap (E_{g}) by carriers. The latter has been difficult to determine due to a cancellation in changes of E_{b} and E_{g}, resulting in little change in optical transition energy at different carrier densities. Here, we quantify band-gap renormalization in macroscopic single crystal MoS_{2} monolayers on SiO_{2} using time and angle-resolved photoemission spectroscopy. At an excitation density above the Mott threshold, E_{g} decreases by as much as 360 meV. We compare the carrier density-dependent E_{g} with previous theoretical calculations and show the necessity of knowing both doping and excitation densities in quantifying the band gap.

摘要

单层半导体(如过渡金属二硫属化物)的一个关键特性是库仑势屏蔽效果不佳,这导致了较大的激子结合能((E_{b}))以及载流子对准粒子带隙((E_{g}))的强烈重整化。由于(E_{b})和(E_{g})的变化相互抵消,使得后者难以确定,这导致在不同载流子密度下光学跃迁能量变化很小。在此,我们使用时间和角分辨光电子能谱对(SiO_{2})上的宏观单晶(MoS_{2})单层中的带隙重整化进行了量化。在高于莫特阈值的激发密度下,(E_{g})降低了多达360毫电子伏特。我们将与载流子密度相关的(E_{g})与先前的理论计算进行了比较,并表明在量化带隙时了解掺杂密度和激发密度两者的必要性。

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