Interdisciplinary Department for Advanced Innovative Manufacturing Engineering, Pusan Natl. Univ., Busan, 46241, Korea.
Department of Optics and Mechatronics Engineering, Pusan Natl. Univ., Busan, 46241, Korea.
J Nanosci Nanotechnol. 2020 Jan 1;20(1):128-134. doi: 10.1166/jnn.2020.17261.
LIL (laser interference lithography), which does not require a mask, is an effective way to create a wide variety of periodic patterns by exposing two laser beams on a specimen. The LIL method can be used for a wide range of nano-pattern spacing by adjusting the laser intensity, exposure time, and development time. In addition, it has been used in many studies due to its advantage with regard to the forming of nanostructures over a large area in a short period of time. However, the existing LIL technique requires demanding precision levels to align the laser beam. In this paper, we attempt to solve this problem by using a prism laser interferometer to complement the complicated beam alignment of LIL. In this study, ma-p1205 PR-coated silicon wafers were exposed to a CW laser with 360 nm wavelength using a contact-type and a non-contact prism interferometer. A rectangular triangular prism and an equilateral triangular prism of N-BK7 were used, and periods of 300 nm and 260 nm were fabricated, respectively. The MATLAB and COMSOL programs were used to compare the theoretical values and fabricated patterns.
LIL（激光干涉光刻）不需要掩模，通过在样品上曝光两束激光，是一种创建各种周期性图案的有效方法。通过调整激光强度、曝光时间和显影时间，LIL 方法可以用于各种纳米图案间距。此外，由于其在短时间内在大面积上形成纳米结构的优势，它已被用于许多研究中。然而，现有的 LIL 技术需要对激光束进行严格的精度对齐。在本文中，我们尝试通过使用棱镜激光干涉仪来解决这个问题，以补充 LIL 复杂的光束对准。在这项研究中，使用接触式和非接触式棱镜干涉仪，用波长为 360nm 的 CW 激光照射 ma-p1205 PR 涂层硅晶片。使用了矩形三角棱镜和等边三角棱镜 N-BK7，分别制作了 300nm 和 260nm 的周期。使用 MATLAB 和 COMSOL 程序比较了理论值和制作的图案。
