Seo Jung-Hun, Park Jung Ho, Kim Seong-Il, Park Bang Ju, Ma Zhenqiang, Choi Jinnil, Ju Byeong-Kwon
J Nanosci Nanotechnol. 2014 Feb;14(2):1521-32. doi: 10.1166/jnn.2014.9199.
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.
本文提供了一篇系统综述，内容涵盖通过激光干涉光刻（LIL）制造纳米级图案及其在光学器件中的应用。LIL是一种光刻方法。它是一种简单、快速的大面积工艺，无需使用掩膜。LIL是用于定义大面积、纳米级、周期性图案结构的强大技术。图案记录在对与两束或多束相干光束干涉相关的强度分布呈非线性响应的光敏介质中。用LIL产生的光刻胶图案是进一步制造纳米结构和生长用作器件构建块的功能材料的平台。综述了通过LIL展示的光学和光子器件，如定向纳米光子学和表面等离子体共振（SPR），或大面积薄膜反射器和抗反射器。还介绍了LIL未来的发展方向以及在其他领域的新兴应用前景。
