Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan 30013, People's Republic of China.
Nanotechnology. 2017 Nov 24;28(47):475301. doi: 10.1088/1361-6528/aa8e5d.
The periodic structure of laser interference lithography (LIL) fabrication is superior to other lithography technologies. In contrast to traditional lithography, LIL has the advantages of being a simple optical system with no mask requirements, low cost, high depth of focus, and large patterning area in a single exposure. Generally, a simulation pattern for the periodic structure is obtained through optical interference prior to its fabrication through LIL. However, the LIL process is complex and combines the fields of optical and polymer materials; thus, a single simulation theory cannot reflect the real situation. Therefore, this research integrates multiple theories, including those of optical interference, standing waves, and photoresist characteristics, to create a mathematical model for the LIL process. The mathematical model can accurately estimate the exposure time and reduce the LIL process duration through trial and error.
激光干涉光刻（LIL）制作的周期性结构优于其他光刻技术。与传统光刻相比，LIL 具有光学系统简单、无需掩模、成本低、景深大、单次曝光面积大等优点。一般来说，在通过 LIL 制作周期性结构之前，通过光学干涉获得周期性结构的模拟图案。然而，LIL 过程复杂，结合了光学和聚合物材料领域；因此，单一的模拟理论无法反映真实情况。因此，本研究整合了多种理论，包括光学干涉、驻波和光致抗蚀剂特性，为 LIL 工艺创建了一个数学模型。该数学模型可以通过反复试验准确估计曝光时间并缩短 LIL 工艺时间。
