Kolomeets N S, Vostrikov V M, Uranova N A
Mental Health Research Centre, Moscow, Russia.
Zh Nevrol Psikhiatr Im S S Korsakova. 2019;119(12):62-68. doi: 10.17116/jnevro201911912162.
A deficit of cortical gray matter myelination in the frontal lobes has been reported in schizophrenia in neuroimaging studies. Previously the decrease in the numerical density (Nv) of oligodendrocytes (NvOl) in layers 3 and 5 in area 10 of the prefrontal cortex (PFC) has been reported in schizophrenia. Oligodendrocyte progenitors proliferate in the adult human brain and form oligodendrocyte clusters for functional-dependent adaptive myelination. We aimed to estimate the NvOl and Nv of oligodendrocyte clusters (NvOlC) in supra- and infragranular sublayers of the PFC in schizophrenia and healthy controls.
17 chronic schizophrenia subjects and 20 healthy matched controls were studied in Nissl-stained sections in sublayers 3a- 3c and 5a of the PFC by stereological optical dissector method.
The NvOl and the NvOlC were significantly decreased in supra- (32%, p<0.02) and infragranular sublayers (50%, p<0.001) of the PFC in the schizophrenia group as compared to controls. The Nv OlC/Nv Ol ratio decreased significantly in the schizophrenia group only in sublayers 3a (p=0.015) and 5a (p<0.001). In the control group, the NvOlC was positively correlated with the NvOl in sublayers 3b, 3c and 5a (R≥0.59; p≤0.006). In the schizophrenia group, a significant correlation between the parameters was found only in sublayer 5a (R=0.8; p<0.001). The deficit of oligodendrocyte clusters might be associated with altered proliferation and/or maturation of oligodendrocyte progenitors in schizophrenia. Specific alterations of the Nv OlC/Nv Ol ratio might be due to different connectivity of supra- and infragranular sublayers of the PFC and their disturbances in schizophrenia.
神经影像学研究报告称,精神分裂症患者额叶皮质灰质髓鞘形成存在缺陷。此前有报道称,精神分裂症患者前额叶皮质(PFC)10区第3层和第5层少突胶质细胞的数量密度(Nv)降低。少突胶质前体细胞在成人大脑中增殖,并形成少突胶质细胞簇以进行功能依赖性适应性髓鞘形成。我们旨在评估精神分裂症患者和健康对照者PFC颗粒上层和颗粒下层少突胶质细胞簇的NvOl和Nv(NvOlC)。
采用体视学光学分割法,对17例慢性精神分裂症患者和20例健康对照者的PFC第3a - 3c层和第5a层的尼氏染色切片进行研究。
与对照组相比,精神分裂症组PFC颗粒上层(降低32%,p<0.02)和颗粒下层(降低50%,p<0.001)的NvOl和NvOlC显著降低。仅在第3a层(p = 0.015)和第5a层(p<0.001),精神分裂症组的Nv OlC/Nv Ol比值显著降低。在对照组中,第3b层、第3c层和第5a层的NvOlC与NvOl呈正相关(R≥0.59;p≤0.006)。在精神分裂症组中,仅在第5a层发现参数之间存在显著相关性(R = 0.8;p<0.001)。少突胶质细胞簇的缺陷可能与精神分裂症中少突胶质前体细胞增殖和/或成熟的改变有关。Nv OlC/Nv Ol比值的特定改变可能是由于PFC颗粒上层和颗粒下层的不同连接性及其在精神分裂症中的紊乱。