Institute for Materials, Ruhr-Universität Bochum, 44801 Bochum, Germany.
Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Strasse 1, 40237 Düsseldorf, Germany.
ACS Comb Sci. 2020 Mar 9;22(3):142-149. doi: 10.1021/acscombsci.9b00182. Epub 2020 Feb 24.
A photolithographic process for the rapid fabrication of thin-film tensile-test structures is presented. The process is applicable to various physical vapor deposition techniques and can be used for the combinatorial fabrication of thin-film tensile-test structure materials libraries for the high-throughput characterization of mechanical properties. The functionality of the fabrication process and the feasibility of performing high-quality measurements with these structures are demonstrated with Cu tensile-test structures. In addition, the scalability from unary structures to libraries with compositional variations is demonstrated.
本文提出了一种用于快速制作薄膜拉伸结构的光刻工艺。该工艺适用于各种物理气相沉积技术，可用于组合式制造薄膜拉伸结构材料库，以实现高通量的机械性能表征。文中通过 Cu 拉伸结构展示了制造工艺的功能以及用这些结构进行高质量测量的可行性。此外，还展示了从单一结构到具有成分变化的库的可扩展性。
