Varghese Abin, Saha Dipankar, Thakar Kartikey, Jindal Vishwas, Ghosh Sayantan, Medhekar Nikhil V, Ghosh Sandip, Lodha Saurabh
Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India.
Department of Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia.
Nano Lett. 2020 Mar 11;20(3):1707-1717. doi: 10.1021/acs.nanolett.9b04879. Epub 2020 Feb 28.
Pn heterojunctions comprising layered van der Waals (vdW) semiconductors have been used to demonstrate current-rectifiers, photodetectors, and photovoltaic devices. However, a direct or near-direct heterointerface bandgap for enhanced photogeneration in high light-absorbing few-layer vdW materials remains unexplored. In this work, for the first time, density functional theory calculations show that the heterointerface of few-layer group-6 transition metal dichalcogenide (TMD) WSe with group-7 ReS results in a sizable (0.7 eV) near-direct type-II bandgap. The interlayer IR bandgap is confirmed through IR photodetection, and microphotoluminescence measurements demonstrate type-II alignment. Few-layer flakes exhibit ultrafast response time (5 μs), high responsivity (3 A/W), and large photocurrent-generation and responsivity-enhancement at the hetero-overlap region (10-100×). Large open-circuit voltage of 0.64 V and short-circuit current of 2.6 μA enable high output electrical power. Finally, long-term air-stability and facile single contact metal fabrication process make the multifunctional few-layer WSe/ReS heterostructure diode technologically promising for next-generation optoelectronics.
由层状范德华(vdW)半导体组成的Pn异质结已被用于展示电流整流器、光电探测器和光伏器件。然而,在高光吸收的少层vdW材料中,用于增强光生载流子的直接或近直接异质界面带隙仍未被探索。在这项工作中,密度泛函理论计算首次表明,少层第6族过渡金属二硫属化物(TMD)WSe与第7族ReS的异质界面导致了相当大的(0.7 eV)近直接II型带隙。通过红外光电探测证实了层间红外带隙,微光致发光测量证明了II型排列。少层薄片表现出超快响应时间(5 μs)、高响应度(3 A/W),并且在异质重叠区域具有大的光电流产生和响应度增强(10 - 100倍)。0.64 V的大开路电压和2.6 μA的短路电流实现了高输出电功率。最后,长期的空气稳定性和简便的单接触金属制造工艺使得多功能少层WSe/ReS异质结构二极管在下一代光电子学中具有技术前景。