Pellacani Paola, Morasso Carlo, Picciolini Silvia, Gallach Dario, Fornasari Lucia, Marabelli Franco, Manso Silvan Miguel
Departamento de Física Aplicada and Instituto de Ciencia de Materiales Nicolás Cabrera, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
Plasmore S.r.l., Via Vittorio Emanuele II 4, 27100 Pavia, Italy.
Materials (Basel). 2020 Mar 10;13(5):1244. doi: 10.3390/ma13051244.
Sequential plasma processes combined with specific lithographic methods allow for the fabrication of advanced material structures. In the present work, we used self-assembled colloidal monolayers as lithographic structures for the conformation of ordered Si submicrometer pillars by reactive ion etching. We explored different discharge conditions to optimize the Si pillar geometry. Selected structures were further decorated with gold by conventional sputtering, prior to colloidal monolayer lift-off. The resulting structures consist of a gold crown, that is, a cylindrical coating on the edge of the Si pillar and a cavity on top. We analysed the Au structures in terms of electronic properties by using X-ray absorption spectroscopy (XAS) prior to and after post-processing with thermal annealing at 300 °C and/or interaction with a gold etchant solution (KI). The angular dependent analysis of the plasmonic properties was studied with Fourier transformed UV-vis measurements. Certain conditions were selected to perform a surface enhanced Raman spectroscopy (SERS) evaluation of these platforms with two model dyes, prior to confirming the potential interest for a well-resolved analysis of filtered blood plasma.
顺序等离子体工艺与特定光刻方法相结合，能够制造先进的材料结构。在本工作中，我们使用自组装胶体单层作为光刻结构，通过反应离子刻蚀来构造有序的硅亚微米柱。我们探索了不同的放电条件以优化硅柱的几何形状。在胶体单层剥离之前，通过传统溅射对选定的结构进一步用金进行修饰。所得结构由金冠组成，即在硅柱边缘的圆柱形涂层和顶部的腔体。我们在300℃进行热退火后处理和/或与金蚀刻剂溶液（KI）相互作用之前和之后，通过X射线吸收光谱（XAS）分析金结构的电子性质。用傅里叶变换紫外可见测量研究等离子体性质的角度依赖性分析。在确认对过滤后的血浆进行良好分辨分析的潜在兴趣之前，选择某些条件用两种模型染料对这些平台进行表面增强拉曼光谱（SERS）评估。
