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在金箔上合成用于超高截止比日盲光电探测的高质量多层六方氮化硼薄膜。

Synthesis of High-Quality Multilayer Hexagonal Boron Nitride Films on Au Foils for Ultrahigh Rejection Ratio Solar-Blind Photodetection.

作者信息

Tan Biying, Yang Huihui, Hu Yunxia, Gao Feng, Wang Lifeng, Dai Mingjin, Zhang Shichao, Shang Huiming, Chen Hongyu, Hu PingAn

机构信息

Key Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, P. R. China.

出版信息

ACS Appl Mater Interfaces. 2020 Jun 24;12(25):28351-28359. doi: 10.1021/acsami.0c00449. Epub 2020 Jun 9.

Abstract

Solar-blind photodetectors have widespread applications due to the unique merit of a "black background" on the earth. However, most solar-blind photodetectors reported previously exhibited quite low rejection ratios (/ < 10) and were interfered with by light longer than 280 nm. Herein, by an ambient pressure chemical vapor deposition (CVD) method, large-area, clean, and uniform two-dimensional (2D) multilayer h-BN films with different thicknesses have been successfully synthesized on Au foils. The synthesized multilayer h-BN film is transparent to light longer than 280 nm, showing excellent optical and optoelectronic properties to weak solar-blind light (μW/cm). This sensitive solar-blind h-BN photodetector exhibits ultrahigh rejection ratios (/ > 10 and / > 10), a low dark current (10 fA), and a large detectivity (3.9 × 10 Jones). It is noteworthy that the rejection ratio (/) here is superior to most of those previously reported based on traditional semiconductors. This large-scale, clean, and uniform multilayer h-BN film will contribute to the progress of next-generation optoelectronic devices.

摘要

日盲型光电探测器由于在地球上具有“黑色背景”这一独特优点而有着广泛的应用。然而,先前报道的大多数日盲型光电探测器的抑制比相当低(/ < 10),并且受到波长大于280 nm的光的干扰。在此,通过常压化学气相沉积(CVD)方法,已成功在金箔上合成了具有不同厚度的大面积、清洁且均匀的二维(2D)多层h-BN薄膜。合成的多层h-BN薄膜对波长大于280 nm的光是透明的,对弱日盲光(μW/cm)表现出优异的光学和光电特性。这种灵敏的日盲型h-BN光电探测器具有超高的抑制比(/ > 10和/ > 10)、低暗电流(10 fA)以及高探测率(3.9 × 10琼斯)。值得注意的是,这里的抑制比(/)优于先前基于传统半导体报道的大多数抑制比。这种大规模、清洁且均匀的多层h-BN薄膜将推动下一代光电器件的发展。

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