Ren Donglou, Luo Xue, Chen Shuo, Zheng Zhuanghao, Cathelinaud Michel, Liang Guangxing, Ma Hongli, Qiao Xvsheng, Fan Xianping, Zhang Xianghua
ISCR (Institut des Sciences Chimiques de Rennes)-CNRS, UMR 6226, Univ. Rennes, F-35000 Rennes, France.
State Key Laboratory of Silicon Materials & School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
Nanomaterials (Basel). 2020 Jul 11;10(7):1358. doi: 10.3390/nano10071358.
Antimony selenide (SbSe) has been widely investigated as a promising absorber material for photovoltaic devices. However, low open-circuit voltage (V) limits the power conversion efficiency (PCE) of SbSe-based cells, largely due to the low-charge carrier density. Herein, high-quality n-type (Tellurium) Te-doped SbSe thin films were successfully prepared using a homemade target via magnetron sputtering. The Te atoms were expected to be inserted in the spacing of (SbSe) ribbons based on increased lattice parameters in this study. Moreover, the thin film was found to possess a narrow and direct band gap of approximately 1.27 eV, appropriate for harvesting the solar energy. It was found that the photoelectric performance is related to not only the quality of films but also the preferred growth orientation. The Te-SbSe film annealed at 325 °C showed a maximum photocurrent density of 1.91 mA/cm with a light intensity of 10.5 mW/cm at a bias of 1.4 V. The fast response and recovery speed confirms the great potential of these films as excellent photodetectors.
硒化锑(SbSe)作为一种有前景的光伏器件吸收材料已被广泛研究。然而,低开路电压(V)限制了基于SbSe的电池的功率转换效率(PCE),这主要归因于低电荷载流子密度。在此,通过磁控溅射使用自制靶材成功制备了高质量的n型(碲)Te掺杂SbSe薄膜。基于本研究中增加的晶格参数,预计Te原子会插入(SbSe)带的间距中。此外,发现该薄膜具有约1.27 eV的窄直接带隙,适合于收集太阳能。发现光电性能不仅与薄膜质量有关,还与择优生长取向有关。在325℃退火的Te-SbSe薄膜在1.4 V偏压下、光强为10.5 mW/cm²时显示出最大光电流密度为1.91 mA/cm²。快速的响应和恢复速度证实了这些薄膜作为优异光电探测器的巨大潜力。