Xu Wei, Xu Weihe, Bouet Nathalie, Zhou Juan, Yan Hanfei, Huang Xiaojing, Pattammattel Ajith, Gao Yuan, Lu Ming, Zalalutdinov Maxim, Chu Yong S, Nazaretski Evgeny
Opt Express. 2020 Jun 8;28(12):17660-17671. doi: 10.1364/OE.389555.
We report on the development of 2D integrated multilayer Laue lens (MLL) nanofocusing optics used for high-resolution x-ray microscopy. A Micro-Electro-Mechanical-Systems (MEMS) - based template has been designed and fabricated to accommodate two linear MLL optics in pre-aligned configuration. The orthogonality requirement between two MLLs has been satisfied to a better than 6 millidegrees level, and the separation along the x-ray beam direction was controlled on a micrometer scale. Developed planar 2D MLL structure has demonstrated astigmatism free point focus of ∼14 nm by ∼13 nm in horizontal and vertical directions, respectively, at 13.6 keV photon energy. Approaching 10 nm resolution with integrated 2D MLL optic is a significant step forward in applications of multilayer Laue lenses for high-resolution hard x-ray microscopy and their adoption by the general x-ray microscopy community.
我们报告了用于高分辨率X射线显微镜的二维集成多层劳厄透镜（MLL）纳米聚焦光学器件的进展。已设计并制造了一种基于微机电系统（MEMS）的模板，以容纳两个预对准配置的线性MLL光学器件。两个MLL之间的正交性要求已满足到优于6毫度的水平，并且沿X射线束方向的间距在微米尺度上得到控制。所开发的平面二维MLL结构在13.6 keV光子能量下，分别在水平和垂直方向上展示了约14 nm×约13 nm的无像散点聚焦。集成二维MLL光学器件接近10 nm的分辨率是多层劳厄透镜在高分辨率硬X射线显微镜应用以及被普通X射线显微镜领域采用方面向前迈出的重要一步。
