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用于高分辨率硬X射线显微镜的基于二维微机电系统的多层劳厄透镜纳米聚焦光学器件。

2D MEMS-based multilayer Laue lens nanofocusing optics for high-resolution hard x-ray microscopy.

作者信息

Xu Wei, Xu Weihe, Bouet Nathalie, Zhou Juan, Yan Hanfei, Huang Xiaojing, Pattammattel Ajith, Gao Yuan, Lu Ming, Zalalutdinov Maxim, Chu Yong S, Nazaretski Evgeny

出版信息

Opt Express. 2020 Jun 8;28(12):17660-17671. doi: 10.1364/OE.389555.

Abstract

We report on the development of 2D integrated multilayer Laue lens (MLL) nanofocusing optics used for high-resolution x-ray microscopy. A Micro-Electro-Mechanical-Systems (MEMS) - based template has been designed and fabricated to accommodate two linear MLL optics in pre-aligned configuration. The orthogonality requirement between two MLLs has been satisfied to a better than 6 millidegrees level, and the separation along the x-ray beam direction was controlled on a micrometer scale. Developed planar 2D MLL structure has demonstrated astigmatism free point focus of ∼14 nm by ∼13 nm in horizontal and vertical directions, respectively, at 13.6 keV photon energy. Approaching 10 nm resolution with integrated 2D MLL optic is a significant step forward in applications of multilayer Laue lenses for high-resolution hard x-ray microscopy and their adoption by the general x-ray microscopy community.

摘要

我们报告了用于高分辨率X射线显微镜的二维集成多层劳厄透镜(MLL)纳米聚焦光学器件的进展。已设计并制造了一种基于微机电系统(MEMS)的模板,以容纳两个预对准配置的线性MLL光学器件。两个MLL之间的正交性要求已满足到优于6毫度的水平,并且沿X射线束方向的间距在微米尺度上得到控制。所开发的平面二维MLL结构在13.6 keV光子能量下,分别在水平和垂直方向上展示了约14 nm×约13 nm的无像散点聚焦。集成二维MLL光学器件接近10 nm的分辨率是多层劳厄透镜在高分辨率硬X射线显微镜应用以及被普通X射线显微镜领域采用方面向前迈出的重要一步。

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