Li Gaoming, Zhang Jingwen, Hu Yaoting, He Yongning
School of Microelectronics, Faculty of Electronic and Information Engineering, Xi'an Jiaotong University, No. 28 Xianning West Road, Xi'an 710049, China.
School of Materials Science and Engineering, Xi'an Jiaotong University, No. 28 Xianning West Road, Xi'an 710049, China.
Materials (Basel). 2020 Jul 22;13(15):3252. doi: 10.3390/ma13153252.
High-performance UV detectors are of great significance for various applications. Plasmonic structures enable great improvement of the performance of detectors. However, to push the plasmonic enhancement to photo response into the deep-UV region presents some challenges. In this work, we found that the optical properties of the supporting layer play important roles in achieving the optimal plasmonic enhancement. Therefore, we fully considered the dependence of the optical constants of the MgZnO supporting layer, which is a promising material to realize deep-UV photodetectors, on microstructure and crystalline quality, which are related to the fabrication method. Based on the optical constants, we designed an Al mesh plasmonic structure and fabricated it with a polystyrene monolayer as a mask. Finally, we demonstrated a three-times enhancement to photo response with UV radiation at 254 nm.
高性能紫外探测器对于各种应用具有重要意义。等离子体结构能够极大地提升探测器的性能。然而，要将等离子体增强的光响应推进到深紫外区域面临一些挑战。在这项工作中，我们发现支撑层的光学性质在实现最佳等离子体增强方面起着重要作用。因此，我们充分考虑了MgZnO支撑层（一种有望实现深紫外光电探测器的材料）的光学常数对微观结构和晶体质量的依赖性，而微观结构和晶体质量与制造方法有关。基于这些光学常数，我们设计了一种铝网等离子体结构，并以聚苯乙烯单层作为掩膜进行制造。最后，我们展示了在254 nm紫外辐射下光响应增强了三倍。
