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低温亚大气压和大气压等离子体治疗红色毛癣菌甲真菌病的体外研究

Cold sub-atmospheric and atmospheric pressure plasma for the treatment of Trichophyton rubrum onychomycosis: An in-vitro study.

作者信息

Shemer Avner, Daniel Ralph, Kassem Riad, Geffen Yuval, Galili Eran

机构信息

Department of Dermatology, Sheba Medical Center, Tel-Hashomer, Ramat-Gan, Israel.

Sackler Faculty of Medicine, Tel Aviv University, Tel Aviv, Israel.

出版信息

Dermatol Ther. 2020 Nov;33(6):e14084. doi: 10.1111/dth.14084. Epub 2020 Aug 19.

Abstract

Previous studies have suggested the applicability of cold atmospheric pressure plasma for the treatment of onychomycosis. Whether delivering cold plasma in sub-atmospheric pressure would be beneficial for this purpose is yet to be established. The current study aimed to evaluate efficacy of cold sub-atmospheric and atmospheric pressure plasma in Trichophyton rubrum growth inhibition. Bovine nails infected with T. rubrum were treated by a cold air plasma device, which enables utilizing plasma in sub-atmospheric pressures (Low = 100 millibar; High = 300 millibar) or atmospheric pressure. The infected foci were exposed to the plasma source directly or indirectly. Treatment with high sub-atmospheric pressure setting achieved T. rubrum growth reduction of 94.0% and 73.0%, for direct and indirect exposure to the plasma source, respectively (P < .001). Low sub-atmospheric pressure setting achieved similar T. rubrum growth reduction of 86.2% for direct exposure to the plasma source (P < .001), but only marginally significant 58.8% reduction rate for indirect exposure to the plasma source (P = .056). None statistically significant fungal growth reduction was attained with the use of atmospheric pressure setting. Cold plasma was shown to effectively inhibit T. rubrum nail growth, with sub-atmospheric pressure setting achieving better outcome than atmospheric pressure.

摘要

先前的研究表明冷大气压等离子体可用于治疗甲癣。在低于大气压的情况下输送冷等离子体是否有利于此目的尚待确定。本研究旨在评估冷低于大气压和大气压等离子体对红色毛癣菌生长抑制的效果。用冷空气等离子体装置处理感染红色毛癣菌的牛指甲,该装置能够在低于大气压(低 = 100 毫巴;高 = 300 毫巴)或大气压下利用等离子体。感染灶直接或间接暴露于等离子体源。在高于大气压的高压设置下进行处理时,直接和间接暴露于等离子体源时,红色毛癣菌的生长分别减少了 94.0% 和 73.0%(P < 0.001)。在低于大气压的低压设置下,直接暴露于等离子体源时红色毛癣菌的生长减少率相似,为 86.2%(P < 0.001),但间接暴露于等离子体源时生长减少率仅为 58.8%,差异无统计学意义(P = 0.056)。使用大气压设置未达到统计学上显著的真菌生长减少。结果表明,冷等离子体可有效抑制红色毛癣菌在指甲上的生长,低于大气压的设置比大气压取得了更好的效果。

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