Agrawal Harshal, Garnett Erik C
Center for Nanophotonics, AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands.
ACS Nano. 2020 Sep 22;14(9):11009-11016. doi: 10.1021/acsnano.0c04793. Epub 2020 Aug 12.
In recent years, imprint lithography has emerged as a promising patterning technique capable of high-speed and volume production. In this work, we report highly reproducible one-step printing of metal nanocubes. A dried film of monocrystalline silver cubes serves as the resist, and a soft polydimethylsiloxane stamp directly imprints the final pattern. The use of atomically smooth and sharp faceted nanocubes facilitates the printing of high-resolution and well-defined patterns with face-to-face alignment between adjacent cubes. It also permits digital control over the line width of patterns such as straight lines, curves, and complex junctions over an area of several square millimeters. Single-particle lattices as well as three-dimensional nanopatterns are also demonstrated with an aspect ratio up to 5 in the vertical direction. The high-fidelity nanocube patterning combined with the previously demonstrated epitaxial overgrowth can enable curved (single) crystals from solution at room temperature or highly efficient transparent conductors.
近年来，压印光刻技术已成为一种有前景的能够进行高速和批量生产的图案化技术。在这项工作中，我们报告了金属纳米立方体的高度可重复的一步印刷。单晶银立方体的干膜用作抗蚀剂，柔软的聚二甲基硅氧烷基印章直接压印出最终图案。使用原子级光滑且具有尖锐刻面的纳米立方体有助于印刷高分辨率和清晰定义的图案，相邻立方体之间实现面对面排列。它还允许对诸如直线、曲线和复杂连接点等图案的线宽进行数字控制，覆盖面积达几平方毫米。还展示了单粒子晶格以及垂直方向上纵横比高达5的三维纳米图案。高保真纳米立方体图案化与先前展示的外延过生长相结合，可以在室温下从溶液中制备出弯曲（单）晶体或高效透明导体。
