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拓扑绝缘体/拓扑晶体绝缘体界面上拓扑态的相互作用。

Interplay of Topological States on TI/TCI Interfaces.

作者信息

Menshchikova Tatiana V, Eremeev Sergey V, Kuznetsov Vladimir M, Chulkov Evgueni V

机构信息

Laboratory of Nanostructured Surfaces and Coatings, Tomsk State University, 634050 Tomsk, Russia.

Laboratory Surface Phenomena Physics, Institute of Strength Physics and Materials Science, Siberian Branch of Russian Academy of Sciences, 634055 Tomsk, Russia.

出版信息

Materials (Basel). 2020 Oct 10;13(20):4481. doi: 10.3390/ma13204481.

Abstract

Based on first-principles calculations, we study electronic structure of interfaces between a Z2 topological insulator (TI) SnBi2Te4 and a topological crystalline insulator (TCI) SnTe. We consider two interface models characterized by the different atomic structure on the contact of the SnTe(111) and SnBi2Te4(0001) slabs: the model when two materials are connected without intermixing (abrupt type of interface) and the interface model predicted to be realized at epitaxial immersion growth on topological insulator substrates (smooth interface). We find that a strong potential gradient at the abrupt interface leads to the redistribution of the topological states deeper from the interface plane which prevents the annihilation of the Γ¯ Dirac states, predicted earlier. In contrast, a smooth interface is characterized by minor charge transfer, which promotes the strong interplay between TI and TCI Γ¯ Dirac cones leading to their complete annihilation.The M¯ topologically protected Dirac state of SnTe(111) survives irrespective of the interface structure.

摘要

基于第一性原理计算,我们研究了Z2拓扑绝缘体(TI)SnBi2Te4与拓扑晶体绝缘体(TCI)SnTe之间界面的电子结构。我们考虑了两种界面模型,其特征在于SnTe(111)和SnBi2Te4(0001)平板接触处的原子结构不同:一种是两种材料不混合连接的模型(突变型界面),另一种是预计在拓扑绝缘体衬底上外延浸没生长时实现的界面模型(平滑界面)。我们发现,突变界面处的强势梯度导致拓扑态从界面平面更深层重新分布,这阻止了先前预测的Γ¯狄拉克态的湮灭。相比之下,平滑界面的特征是少量电荷转移,这促进了TI和TCI Γ¯狄拉克锥之间的强相互作用,导致它们完全湮灭。SnTe(111)的M¯拓扑保护狄拉克态无论界面结构如何都能幸存。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/81de/7601830/326951c63c6d/materials-13-04481-g001.jpg

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