Ben Gouider Trabelsi A, V Kusmartsev F, Kusmartseva A, H Alkallas F, AlFaify S, Shkir Mohd
Department of Physics, College of Science, Princess Nourah bint Abdulrahman University, Riyadh PO Box 84428, Saudi Arabia.
Department of Physics, Loughborough University, Loughborough LE11 3TU, UK.
Nanomaterials (Basel). 2020 Nov 11;10(11):2234. doi: 10.3390/nano10112234.
Graphene distinctive electronic and optical properties have sparked intense interest throughout the scientific community bringing innovation and progress to many sectors of academia and industry. Graphene manufacturing has rapidly evolved since its discovery in 2004. The diverse growth methods of graphene have many comparative advantages in terms of size, shape, quality and cost. Specifically, epitaxial graphene is thermally grown on a silicon carbide (SiC) substrate. This type of graphene is unique due to its coexistence with the SiC underneath which makes the process of transferring graphene layers for devices manufacturing simple and robust. Raman analysis is a sensitive technique extensively used to explore nanocarbon material properties. Indeed, this method has been widely used in graphene studies in fundamental research and application fields. We review the principal Raman scattering processes in SiC substrate and demonstrate epitaxial graphene growth. We have identified the Raman bands signature of graphene for different layers number. The method could be readily adopted to characterize structural and exceptional electrical properties for various epitaxial graphene systems. Particularly, the variation of the charge carrier concentration in epitaxial graphene of different shapes and layers number have been precisely imaged. By comparing the intensity ratio of 2D line and G line-"I/I"-the density of charge across the graphene layers could be monitored. The obtained results were compared to previous electrical measurements. The substrate longitudinal optical phonon coupling "LOOPC" modes have also been examined for several epitaxial graphene layers. The LOOPC of the SiC substrate shows a precise map of the density of charge in epitaxial graphene systems for different graphene layers number. Correlations between the density of charge and particular graphene layer shape such as bubbles have been determined. All experimental probes show a high degree of consistency and efficiency. Our combined studies have revealed novel capacitor effect in diverse epitaxial graphene system. The SiC substrate self-compensates the graphene layer charge without any external doping. We have observed a new density of charge at the graphene-substrate interface. The located capacitor effects at epitaxial graphene-substrate interfaces give rise to an unexpected mini gap in graphene band structure.
石墨烯独特的电子和光学特性在整个科学界引发了浓厚兴趣,为学术界和工业界的许多领域带来了创新和进步。自2004年被发现以来,石墨烯制造技术迅速发展。石墨烯多样的生长方法在尺寸、形状、质量和成本方面具有许多比较优势。具体而言,外延石墨烯是在碳化硅(SiC)衬底上热生长而成。这种类型的石墨烯很独特,因为它与下方的SiC共存,这使得将石墨烯层转移用于器件制造的过程简单且可靠。拉曼分析是一种广泛用于探索纳米碳材料特性的灵敏技术。事实上,该方法已在石墨烯研究的基础研究和应用领域中广泛使用。我们回顾了SiC衬底中的主要拉曼散射过程,并展示了外延石墨烯的生长。我们已经确定了不同层数石墨烯的拉曼带特征。该方法可轻松用于表征各种外延石墨烯系统的结构和特殊电学性质。特别是,不同形状和层数的外延石墨烯中载流子浓度的变化已被精确成像。通过比较2D线和G线的强度比——“I/I”,可以监测石墨烯层上的电荷密度。将获得的结果与先前的电学测量结果进行了比较。还对外延石墨烯的几个层的衬底纵向光学声子耦合(“LOOPC”)模式进行了研究。SiC衬底的LOOPC显示了不同层数的外延石墨烯系统中电荷密度的精确图谱。已经确定了电荷密度与特定石墨烯层形状(如气泡)之间的相关性。所有实验探针都显示出高度的一致性和效率。我们的综合研究揭示了不同外延石墨烯系统中的新型电容效应。SiC衬底在没有任何外部掺杂的情况下自我补偿石墨烯层电荷。我们在石墨烯 - 衬底界面观察到了新的电荷密度。外延石墨烯 - 衬底界面处的定位电容效应在石墨烯能带结构中产生了意想不到的小间隙。