Engberg Sara, Martinho Filipe, Gansukh Mungunshagai, Protti Alexander, Küngas Rainer, Stamate Eugen, Hansen Ole, Canulescu Stela, Schou Jørgen
DTU Fotonik, Technical University of Denmark, 4000 Roskilde, Denmark.
Haldor Topsøe, 2800 Kgs. Lyngby, Denmark.
Sci Rep. 2020 Nov 27;10(1):20749. doi: 10.1038/s41598-020-77592-z.
In this paper, we study the DMSO/thiourea/chloride salt system for synthesis of pure-sulfide [Formula: see text] (CZTS) thin-film solar cells under ambient conditions. We map out the ink constituents and determine the effect of mixing time and filtering. The thermal behavior of the ink is analyzed, and we find that more than 90% of the solvent has evaporated at [Formula: see text]. However, chloride and sulfoxide species are released continually until [Formula: see text], suggesting the advantage of a higher pre-annealing temperature, which is also commonly observed in the spin-coating routines in literature. Another advantage of a higher pre-annealing temperature is that the worm-like pattern in the spin-coated film can be avoided. We hypothesize that this pattern forms as a result of hydrodynamics within the film as it dries, and it causes micro-inhomogeneities in film morphology. Devices were completed in order to finally evaluate the effect of varying thermal exposure during pre-annealing. Contrary to the previous observations, a lower pre-annealing temperature of [Formula: see text] results in the best device efficiency of 4.65%, which to the best of our knowledge is the highest efficiency obtained for a pure-sulfide kesterite made with DMSO. Lower thermal exposure during pre-annealing results in larger grains and a thicker [Formula: see text] layer at the CZTS/Mo interface. Devices completed at higher pre-annealing temperatures display the existence of either a Cu-S secondary phase or an incomplete sulfurization with smaller grains and a fine-grain layer at the back interface.
在本文中,我们研究了二甲基亚砜/硫脲/氯化物盐体系,用于在环境条件下合成纯硫化物[化学式:见正文](CZTS)薄膜太阳能电池。我们绘制了墨水成分图,并确定了混合时间和过滤的影响。分析了墨水的热行为,我们发现超过90%的溶剂在[化学式:见正文]时已经蒸发。然而,氯化物和亚砜物种会持续释放,直到[化学式:见正文],这表明较高的预退火温度具有优势,这在文献中的旋涂工艺中也普遍观察到。较高预退火温度的另一个优点是可以避免旋涂膜中出现蠕虫状图案。我们推测这种图案是由于膜干燥时内部的流体动力学形成的,并且它会导致膜形态的微观不均匀性。制备了器件,以便最终评估预退火期间不同热暴露的影响。与先前的观察结果相反,较低的预退火温度[化学式:见正文]导致了最佳器件效率4.65%,据我们所知,这是用二甲基亚砜制备的纯硫化物锡基硫族化合物所获得的最高效率。预退火期间较低的热暴露会导致更大的晶粒以及CZTS/Mo界面处更厚的[化学式:见正文]层。在较高预退火温度下制备的器件显示出存在Cu-S次生相或不完全硫化,晶粒较小且背面界面处有细晶粒层。