Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, United States.
J Am Chem Soc. 2020 Dec 23;142(51):21272-21278. doi: 10.1021/jacs.0c10899. Epub 2020 Dec 8.
The construction of C(sp)-Si bonds is important in synthetic, medicinal, and materials chemistry. In this context, reactions mediated by silyl radicals have become increasingly attractive but methods for accessing these intermediates remain limited. We present a new strategy for silyl radical generation via electroreduction of readily available chlorosilanes. At highly biased potentials, electrochemistry grants access to silyl radicals through energetically uphill reductive cleavage of strong Si-Cl bonds. This strategy proved to be general in various alkene silylation reactions including disilylation, hydrosilylation, and allylic silylation under simple and transition-metal-free conditions.
C(sp)-Si 键的构建在合成、医药和材料化学中都很重要。在这种情况下,由硅自由基介导的反应变得越来越有吸引力,但获得这些中间体的方法仍然有限。我们提出了一种通过电化学还原易得的氯硅烷来生成硅自由基的新策略。在高偏压下,电化学通过能量上有利的强 Si-Cl 键还原裂解来获得硅自由基。该策略在各种烯烃硅烷化反应中得到了广泛的应用,包括二硅化、氢化硅烷化和烯丙基硅烷化,条件简单且无需过渡金属。