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一种新型双阳离子硼二吡咯甲川染料类光动力抗菌剂用于治疗耐甲氧西林金黄色葡萄球菌感染。

A Novel Dicationic Boron Dipyrromethene-based Photosensitizer for Antimicrobial Photodynamic Therapy against Methicillin-Resistant Staphylococcus aureus.

机构信息

School of Biomedical Sciences, Faculty of Medicine, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong.

Department of Chemistry, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong.

出版信息

Curr Med Chem. 2021;28(21):4283-4294. doi: 10.2174/0929867328666201208095105.

Abstract

BACKGROUND

We report herein the synthesis of a novel dicationic boron dipyrromethene derivative (compound 3) which is symmetrically substituted with two trimethylammonium styryl groups.

METHODS

The antibacterial photodynamic activity of compound 3 was determined against sixteen methicillin-resistant Staphylococcus aureus (MRSA) strains, including four ATCC type strains (ATCC 43300, ATCC BAA-42, ATCC BAA-43, and ATCC BAA-44), two mutant strains [AAC(6')-APH(2") and RN4220/pUL5054], and ten nonduplicate clinical strains of hospital- and community-associated MRSA. Upon light irradiation, the minimum bactericidal concentrations of compound 3 were in the range of 1.56-50 μM against all the sixteen MRSA strains. Interestingly, compound 3 was not only more active than an analogue in which the ammonium groups are not directly connected to the n-conjugated system (compound 4), but also showed significantly higher (p < 0.05) antibacterial potency than the clinically approved photosensitizer methylene blue. The skin irritation of compound 3 during topical application was tested on human 3-D skin constructs and proven to be non-irritant in vivo at concentrations below 1.250 mM. In the murine MRSA infected wound study, the colony forming unit reduction of compound 3 + PDT group showed significantly (p < 0.05) higher value (>2.5 log) compared to other test groups except for the positive control.

CONCLUSION

In conclusion, the present study provides a scientific basis for future development of compound 3 as a potent photosensitizer for photodynamic therapy for MRSA wound infection.

摘要

背景

我们在此报告了一种新型二阳离子硼二吡咯甲川染料衍生物(化合物 3)的合成,该化合物 3 带有两个三甲铵基苯乙烯基团对称取代。

方法

测定了化合物 3 对 16 株耐甲氧西林金黄色葡萄球菌(MRSA)菌株的抗菌光动力活性,包括 4 株 ATCC 标准株(ATCC 43300、ATCC BAA-42、ATCC BAA-43 和 ATCC BAA-44)、2 株突变株[AAC(6')-APH(2")和 RN4220/pUL5054]和 10 株非重复的医院和社区相关 MRSA 临床分离株。在光照下,化合物 3 对所有 16 株 MRSA 菌株的最低杀菌浓度范围为 1.56-50 μM。有趣的是,化合物 3 不仅比铵基未直接连接到 n-共轭系统的类似物(化合物 4)更有效,而且与临床批准的光敏剂亚甲蓝相比,显示出显著更高的(p<0.05)抗菌效力。在人体 3-D 皮肤模型上测试了化合物 3 在局部应用时的皮肤刺激性,结果证明在低于 1.250 mM 的浓度下体内无刺激性。在小鼠 MRSA 感染伤口研究中,与其他测试组相比,化合物 3+PDT 组的集落形成单位减少率(p<0.05)明显更高(>2.5 log),除阳性对照组外。

结论

总之,本研究为将化合物 3 开发为治疗 MRSA 伤口感染的光动力疗法的有效光敏剂提供了科学依据。

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