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Superconducting Contact Geometries for Next-Generation Quantized Hall Resistance Standards.用于下一代量子化霍尔电阻标准的超导接触几何结构。
IEEE Trans Instrum Meas. 2020;1.633481E6. doi: 10.1109/CPEM49742.2020.9191753.
2
Two-Terminal and Multi-Terminal Designs for Next-Generation Quantized Hall Resistance Standards: Contact Material and Geometry.下一代量子化霍尔电阻标准的双端和多端设计:接触材料与几何形状
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本文引用的文献

1
The Quantum Hall Effect in the Era of the New SI.新国际单位制时代的量子霍尔效应
Semicond Sci Technol. 2019;34(9). doi: 10.1088/1361-6641/ab37d3.
2
Implementation of a graphene quantum Hall Kelvin bridge-on-a-chip for resistance calibrations.用于电阻校准的片上石墨烯量子霍尔开尔文桥的实现。
Metrologia. 2020;57(1). doi: 10.1088/1681-7575/ab581e.
3
Next-generation crossover-free quantum Hall arrays with superconducting interconnections.具有超导互连的下一代无交叉量子霍尔阵列。
Metrologia. 2019;56(6). doi: 10.1088/1681-7575/ab3ba3.
4
Two-Terminal and Multi-Terminal Designs for Next-Generation Quantized Hall Resistance Standards: Contact Material and Geometry.下一代量子化霍尔电阻标准的双端和多端设计:接触材料与几何形状
IEEE Trans Electron Devices. 2019;66(9). doi: 10.1109/ted.2019.2926684.
5
Gateless and reversible carrier density tunability in epitaxial graphene devices functionalized with chromium tricarbonyl.用三羰基铬功能化的外延石墨烯器件中无栅且可逆的载流子密度可调性。
Carbon N Y. 2019;142. doi: 10.1016/j.carbon.2018.10.085.
6
Electrical Stabilization of Surface Resistivity in Epitaxial Graphene Systems by Amorphous Boron Nitride Encapsulation.通过非晶态氮化硼封装实现外延石墨烯系统表面电阻率的电稳定化。
ACS Omega. 2017;2(5):2326-2332. doi: 10.1021/acsomega.7b00341. Epub 2017 May 25.

用于下一代量子化霍尔电阻标准的超导接触几何结构。

Superconducting Contact Geometries for Next-Generation Quantized Hall Resistance Standards.

作者信息

Panna Alireza R, Kruskopf Mattias, Rigosi Albert F, Marzano Martina, Patel Dinesh K, Payagala Shamith U, Jarrett Dean G, Newell David B, Elmquist Randolph E

机构信息

National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.

Physikalisch-Technische Bundesanstalt, Department of Electrical Quantum Metrology, Braunschweig, 38116, Germany.

出版信息

IEEE Trans Instrum Meas. 2020;1.633481E6. doi: 10.1109/CPEM49742.2020.9191753.

DOI:10.1109/CPEM49742.2020.9191753
PMID:33335333
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7739517/
Abstract

Precision quantum Hall resistance measurements can be greatly improved when implementing new electrical contact geometries made from superconducting NbTiN. The sample designs described here minimize undesired resistances at contacts and interconnections, enabling further enhancement of device size and complexity when pursuing next-generation quantized Hall resistance devices.

摘要

当采用由超导铌钛氮化物制成的新型电接触几何结构时,精密量子霍尔电阻测量可以得到极大改善。这里描述的样品设计将接触点和互连处的不必要电阻降至最低,在追求下一代量子化霍尔电阻器件时能够进一步增大器件尺寸并提高其复杂度。