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用于量子电阻计量的外延石墨烯。

Epitaxial graphene for quantum resistance metrology.

作者信息

Kruskopf Mattias, Elmquist Randolph E

机构信息

National Institute of Standards and Technology, Fundamental Electrical Measurements, 100 Bureau Drive, Gaithersburg, MD, United States of America.

University of Maryland, Joint Quantum Institute, College Park, MD, United States of America.

出版信息

Metrologia. 2018;55. doi: 10.1088/1681-7575/aacd23.

DOI:10.1088/1681-7575/aacd23
PMID:30996479
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6463316/
Abstract

Graphene-based quantised Hall resistance standards promise high precision for the unit ohm under less exclusive measurement conditions, enabling the use of compact measurement systems. To meet the requirements of metrological applications, national metrology institutes developed large-area monolayer graphene growth methods for uniform material properties and optimized device fabrication techniques. Precision measurements of the quantized Hall resistance showing the advantage of graphene over GaAs-based resistance standards demonstrate the remarkable achievements realized by the research community. This work provides an overview over the state-of-the-art technologies in this field.

摘要

基于石墨烯的量子化霍尔电阻标准有望在不太苛刻的测量条件下实现欧姆单位的高精度测量,从而能够使用紧凑型测量系统。为满足计量应用的要求,国家计量机构开发了大面积单层石墨烯生长方法以实现均匀的材料特性,并优化了器件制造技术。对量子化霍尔电阻的精确测量显示出石墨烯相对于基于砷化镓的电阻标准的优势,证明了研究界取得的显著成就。这项工作概述了该领域的最新技术。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/b917c676b39a/nihms-1508137-f0008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/193fb756d6a6/nihms-1508137-f0001.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/c80ab387225a/nihms-1508137-f0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/bb1e5509b310/nihms-1508137-f0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/414fa439f196/nihms-1508137-f0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/d84596a9e7bf/nihms-1508137-f0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/b917c676b39a/nihms-1508137-f0008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/193fb756d6a6/nihms-1508137-f0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/5b0cc5560720/nihms-1508137-f0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/86cad44b94e8/nihms-1508137-f0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/c80ab387225a/nihms-1508137-f0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/bb1e5509b310/nihms-1508137-f0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/414fa439f196/nihms-1508137-f0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/d84596a9e7bf/nihms-1508137-f0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4528/6463316/b917c676b39a/nihms-1508137-f0008.jpg

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