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镍掺杂氧化锌薄膜:沉积、表征及光催化应用

Ni-Doped ZnO Thin Films: Deposition, Characterization and Photocatalytic Applications.

作者信息

Moorthy K, Inbanathan S S R, Gopinathan C, Lalla N P, Alghamdi Abdulaziz Ali, Kumar Rajesh, Rani Rosaline D, Umar Ahmad

机构信息

Postgraduate and Research Department of Physics, The American College, Madurai 625002, India.

School of Energy Sciences, Madurai Kamaraj University, Madurai 625107, India.

出版信息

J Nanosci Nanotechnol. 2021 Mar 1;21(3):1560-1569. doi: 10.1166/jnn.2021.18981.

Abstract

Root like structured Ni-doped zinc oxide [ZnNiO ( = 0.09)] thin films were deposited on a non-conducting glass substrate by indigenously developed spray pyrolysis system at optimized substrate hotness of 573±5 K. Thus obtained Ni-doped ZnO thin films were characterized by UV-visible spectroscopy, X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX), Atomic Force Microscopy (AFM). XRD result revealed that Ni-doped ZnO has a polycrystalline nature with a hexagonal wurtzite structure. For pure ZnO and Ni-doped ZnO thin films, the particle sizes were 60.9 and 53.3 nm while lattice strain values were 1.56×10 and 1.14×10, respectively. The film surface showed characteristic root-like structure as observed by the SEM. It was observed that the Ni-doped ZnO thin films were grown in high density along with more extent of branching as compared to pure ZnO thin films but retained the root-like morphologies, however, the branches were more-thinner and of shorter lengths. AFM analysis showed that the surface grains of the Ni-doped samples are homogeneous with less RMS roughness values compared with the undoped ZnO samples. The photocatalytic activity of the prepared thin films was evaluated by the degradation of methyl orange (MO) dye under UV light irradiation. Pure ZnO and Ni-doped ZnO thin films took 150 min and 100 min to degrade about 60% MO dye, respectively.

摘要

通过自主研发的喷雾热解系统,在优化后的573±5K衬底温度下,将根状结构的镍掺杂氧化锌[ZnNiO(=0.09)]薄膜沉积在非导电玻璃衬底上。通过紫外可见光谱、X射线衍射(XRD)、扫描电子显微镜(SEM)、能量色散X射线光谱(EDX)、原子力显微镜(AFM)对由此获得的镍掺杂氧化锌薄膜进行表征。XRD结果表明,镍掺杂氧化锌具有多晶性质,为六方纤锌矿结构。对于纯氧化锌和镍掺杂氧化锌薄膜,粒径分别为60.9nm和53.3nm,晶格应变值分别为1.56×10和1.14×10。如SEM观察到的,薄膜表面呈现出特征性的根状结构。观察发现,与纯氧化锌薄膜相比,镍掺杂氧化锌薄膜以高密度生长,且分支程度更大,但仍保留根状形态,不过分支更细且长度更短。AFM分析表明,与未掺杂的氧化锌样品相比,镍掺杂样品的表面晶粒均匀,均方根粗糙度值更小。通过在紫外光照射下降解甲基橙(MO)染料来评估制备薄膜的光催化活性。纯氧化锌和镍掺杂氧化锌薄膜分别需要150分钟和100分钟来降解约60%的MO染料。

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