UV response characteristics of mixed-phase MgZnO thin films with different structure distribution and high I/Iratio and fast speed MgZnO UV detector with tunneling breakdown mechanism.

High performance UV detector with both high response and fast speed is hard to made on homogeneous crystal semiconductor materials. Here, the UV response characteristics of mix-phase MgZnO thin films with different internal structure distribution are studied, the mix-phase MgZnO based detector with given crystal composition own high response at both deep UV light (96 A/W at 240nm) and near UV light (80 A/W at 335nm). Meanwhile, because of quasi-tunneling breakdown mechanism within the device, the high response UV detector also show fast response speed (t= 0.11 µs) and recovery speed (t=26 µs) at deep UV light, which are much faster than the both low response mix-phase MgZnO based UV detectors with other structure constitution and reported high response UV devices on homogenous crystal materials. The Iof the device is just 4.27 pA under a 5 V bias voltage, so the signal to noise ratio of the device reached 23852 at 5.5uW/cm2 235nm UV light. Therefore, new quasi-tunneling breakdown mechanism is observed in some mix-phase MgZnO thin film that contains both c-MgZnO and h-MgZnO parts, which introduced high response, signal to noise ratio and fast speed into mix-phase MgZnO based UV detector at weak deep UV light.