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单层三碘化铬中的成像空位缺陷

Imaging Vacancy Defects in Single-Layer Chromium Triiodide.

作者信息

Zhang Jihai, Guo Yu, Li Peigen, Wang Jun, Zhou Si, Zhao Jijun, Guo Donghui, Zhong Dingyong

机构信息

School of Physics, Sun Yat-sen University, 510275 Guangzhou, China.

State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, 510275 Guangzhou, China.

出版信息

J Phys Chem Lett. 2021 Mar 11;12(9):2199-2205. doi: 10.1021/acs.jpclett.1c00112. Epub 2021 Feb 25.

Abstract

As a van der Waals magnetic semiconductor, chromium triiodide (CrI) is widely considered for its high research value and potential applications. Defects in CrI are inevitably present and significantly alter the material properties. However, experimental identification of defects of CrI at the atomic level is still lacking. Here for the first time, we carried out a scanning tunneling microscopy (STM) study and density functional theory calculations to explore the intrinsic defects in monolayer CrI grown by molecular beam epitaxy. The three most common types of intrinsic point defects, i.e., I vacancy (V), Cr vacancy (V), and multiatom CrI vacancy (V) with distinct spatial distributions of the localized defect states, are identified and characterized by high-resolution STM. Moreover, defect concentrations are estimated based on our experiments, which agree with the calculated formation energies. Our findings provide vital knowledge on the types, concentrations, electronic structures, and migration mechanism of the intrinsic point defects in monolayer CrI for future defect engineering of this novel 2D magnet.

摘要

作为一种范德华磁性半导体,三碘化铬(CrI)因其高研究价值和潜在应用而被广泛关注。CrI中不可避免地存在缺陷,这些缺陷会显著改变材料性能。然而,目前仍缺乏在原子水平上对CrI缺陷进行实验鉴定的方法。在此,我们首次进行了扫描隧道显微镜(STM)研究和密度泛函理论计算,以探索通过分子束外延生长的单层CrI中的本征缺陷。通过高分辨率STM识别并表征了三种最常见的本征点缺陷类型,即碘空位(VI)、铬空位(VCr)和具有不同局域缺陷态空间分布的多原子CrI空位(VCrI)。此外,我们根据实验估算了缺陷浓度,其与计算得到的形成能相符。我们的研究结果为单层CrI中本征点缺陷 的类型、浓度、电子结构和迁移机制提供了重要知识,有助于未来对这种新型二维磁体进行缺陷工程设计。

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