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铜/氧化铜的颜色。

Color of Copper/Copper Oxide.

作者信息

Kim Su Jae, Kim Seonghoon, Lee Jegon, Jo Yongjae, Seo Yu-Seong, Lee Myounghoon, Lee Yousil, Cho Chae Ryong, Kim Jong-Pil, Cheon Miyeon, Hwang Jungseek, Kim Yong In, Kim Young-Hoon, Kim Young-Min, Soon Aloysius, Choi Myunghwan, Choi Woo Seok, Jeong Se-Young, Lee Young Hee

机构信息

Crystal Bank Research Institute, Pusan National University, Busan, 46241, Republic of Korea.

Research Institute of Basic Science, Seoul National University, Seoul, 08826, Republic of Korea.

出版信息

Adv Mater. 2021 Apr;33(15):e2007345. doi: 10.1002/adma.202007345. Epub 2021 Mar 9.

DOI:10.1002/adma.202007345
PMID:33751679
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11469196/
Abstract

Stochastic inhomogeneous oxidation is an inherent characteristic of copper (Cu), often hindering color tuning and bandgap engineering of oxides. Coherent control of the interface between metal and metal oxide remains unresolved. Coherent propagation of an oxidation front in single-crystal Cu thin film is demonstrated to achieve a full-color spectrum for Cu by precisely controlling its oxide-layer thickness. Grain-boundary-free and atomically flat films prepared by atomic-sputtering epitaxy allow tailoring of the oxide layer with an abrupt interface via heat treatment with a suppressed temperature gradient. Color tuning of nearly full-color red/green/blue indices is realized by precise control of the oxide-layer thickness; the samples cover ≈50.4% of the standard red/green/blue color space. The color of copper/copper oxide is realized by the reconstruction of the quantitative yield color from the oxide "pigment" (complex dielectric functions of Cu O) and light-layer interference (reflectance spectra obtained from the Fresnel equations) to produce structural color. Furthermore, laser-oxide lithography is demonstrated with micrometer-scale linewidth and depth through local phase transformation to oxides embedded in the metal, providing spacing necessary for semiconducting transport and optoelectronics functionality.

摘要

随机非均匀氧化是铜(Cu)的固有特性,常常阻碍氧化物的颜色调节和带隙工程。金属与金属氧化物界面的相干控制问题仍未解决。通过精确控制单晶Cu薄膜中氧化前沿的相干传播,实现了Cu的全光谱颜色调节,这是通过精确控制其氧化层厚度来实现的。通过原子溅射外延制备的无晶界且原子级平整的薄膜,允许通过具有抑制温度梯度的热处理来裁剪具有陡峭界面的氧化层。通过精确控制氧化层厚度实现了近全彩红/绿/蓝指数的颜色调节;样品覆盖了标准红/绿/蓝颜色空间的约50.4%。铜/氧化铜的颜色是通过从氧化物“颜料”(CuO的复介电函数)和光层干涉(从菲涅耳方程获得的反射光谱)重建定量产率颜色以产生结构色来实现的。此外,通过局部相变为嵌入金属中的氧化物展示了具有微米级线宽和深度的激光氧化光刻,为半导体传输和光电子功能提供了必要的间距。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/62e746c40774/ADMA-33-2007345-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/5fdd36af46ed/ADMA-33-2007345-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/d717c02cfb2f/ADMA-33-2007345-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/b9e6bcb10c69/ADMA-33-2007345-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/62e746c40774/ADMA-33-2007345-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/5fdd36af46ed/ADMA-33-2007345-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/d717c02cfb2f/ADMA-33-2007345-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/b9e6bcb10c69/ADMA-33-2007345-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/500e/11469196/62e746c40774/ADMA-33-2007345-g001.jpg

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