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二维场效应晶体管中的肖特基势垒高度:从理论到实验

Schottky barrier heights in two-dimensional field-effect transistors: from theory to experiment.

作者信息

Wang Yangyang, Liu Shiqi, Li Qiuhui, Quhe Ruge, Yang Chen, Guo Ying, Zhang Xiuying, Pan Yuanyuan, Li Jingzhen, Zhang Han, Xu Lin, Shi Bowen, Tang Hao, Li Ying, Yang Jinbo, Zhang Zhiyong, Xiao Lin, Pan Feng, Lu Jing

机构信息

Nanophotonics and Optoelectronics Research Center, Qian Xuesen Laboratory of Space Technology, China Academy of Space Technology, Beijing 100094, People's Republic of China.

State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, People's Republic of China.

出版信息

Rep Prog Phys. 2021 Apr 27;84(5). doi: 10.1088/1361-6633/abf1d4.

Abstract

Over the past decade, two-dimensional semiconductors (2DSCs) have aroused wide interest due to their extraordinary electronic, magnetic, optical, mechanical, and thermal properties, which hold potential in electronic, optoelectronic, thermoelectric applications, and so forth. The field-effect transistor (FET), a semiconductor gated with at least three terminals, is pervasively exploited as the device geometry for these applications. For lack of effective and stable substitutional doping techniques, direct metal contact is often used in 2DSC FETs to inject carriers. A Schottky barrier (SB) generally exists in the metal-2DSC junction, which significantly affects and even dominates the performance of most 2DSC FETs. Therefore, low SB or Ohmic contact is highly preferred for approaching the intrinsic characteristics of the 2DSC channel. In this review, we systematically introduce the recent progress made in theoretical prediction of the SB height (SBH) in the 2DSC FETs and the efforts made both in theory and experiments to achieve low SB contacts. From the comparison between the theoretical and experimentally observed SBHs, the emerging first-principles quantum transport simulation turns out to be the most powerful theoretical tool to calculate the SBH of a 2DSC FET. Finally, we conclude this review from the viewpoints of state-of-the-art electrode designs for 2DSC FETs.

摘要

在过去十年中,二维半导体(2DSCs)因其非凡的电子、磁、光、机械和热性能而引起了广泛关注,这些性能在电子、光电子、热电应用等方面具有潜力。场效应晶体管(FET)是一种具有至少三个端子的半导体门控器件,被广泛用作这些应用的器件几何结构。由于缺乏有效且稳定的替代掺杂技术,2DSC FET中常使用直接金属接触来注入载流子。金属-2DSC结中通常存在肖特基势垒(SB),这显著影响甚至主导了大多数2DSC FET的性能。因此,为了接近2DSC沟道的本征特性,低SB或欧姆接触是非常理想的。在这篇综述中,我们系统地介绍了2DSC FET中肖特基势垒高度(SBH)理论预测的最新进展,以及在理论和实验上为实现低SB接触所做的努力。通过理论和实验观测的SBH之间的比较,新兴的第一性原理量子输运模拟成为计算2DSC FET的SBH最强大的理论工具。最后,我们从2DSC FET的最新电极设计观点对本综述进行总结。

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