Suppr超能文献

有患精神病风险个体及精神分裂症患者的颞横回重复模式

Heschl's Gyrus Duplication Pattern in Individuals at Risk of Developing Psychosis and Patients With Schizophrenia.

作者信息

Takahashi Tsutomu, Sasabayashi Daiki, Takayanagi Yoichiro, Higuchi Yuko, Mizukami Yuko, Nishiyama Shimako, Furuichi Atsushi, Kido Mikio, Pham Tien Viet, Kobayashi Haruko, Noguchi Kyo, Suzuki Michio

机构信息

Department of Neuropsychiatry, Graduate School of Medicine and Pharmaceutical Sciences, University of Toyama, Toyama, Japan.

Research Center for Idling Brain Science, University of Toyama, Toyama, Japan.

出版信息

Front Behav Neurosci. 2021 Apr 20;15:647069. doi: 10.3389/fnbeh.2021.647069. eCollection 2021.

Abstract

An increased prevalence of duplicated Heschl's gyrus (HG), which may reflect an early neurodevelopmental pathology, has been reported in schizophrenia (Sz). However, it currently remains unclear whether individuals at risk of psychosis exhibit similar brain morphological characteristics. This magnetic resonance imaging study investigated the distribution of HG gyrification patterns [i.e., single HG, common stem duplication (CSD), and complete posterior duplication (CPD)] and their relationship with clinical characteristics in 57 individuals with an at-risk mental state (ARMS) [of whom 5 (8.8%) later developed Sz], 63 patients with Sz, and 61 healthy comparisons. The prevalence of duplicated HG patterns (i.e., CSD or CPD) bilaterally was significantly higher in the ARMS and Sz groups than in the controls, whereas no significant differences were observed in HG patterns between these groups. The left CSD pattern, particularly in the Sz group, was associated with a verbal fluency deficit. In the ARMS group, left CSD pattern was related to a more severe general psychopathology. The present results suggest that an altered gyrification pattern on the superior temporal plane reflects vulnerability factors associated with Sz, which may also contribute to the clinical features of high-risk individuals, even without the onset of psychosis.

摘要

在精神分裂症(Sz)患者中,已报道双侧颞横回(HG)重复出现的患病率增加,这可能反映了早期神经发育病理学特征。然而,目前尚不清楚有精神病风险的个体是否表现出类似的脑形态学特征。这项磁共振成像研究调查了57名有精神病风险状态(ARMS)的个体(其中5名(8.8%)后来发展为精神分裂症)、63名精神分裂症患者和61名健康对照者的HG脑回形成模式分布[即单HG、共同干重复(CSD)和完全后重复(CPD)]及其与临床特征的关系。双侧重复HG模式(即CSD或CPD)的患病率在ARMS组和精神分裂症组中显著高于对照组,而这些组之间在HG模式上未观察到显著差异。左侧CSD模式,特别是在精神分裂症组中,与言语流畅性缺陷有关。在ARMS组中,左侧CSD模式与更严重的一般精神病理学有关。目前的结果表明,颞上平面脑回形成模式的改变反映了与精神分裂症相关的易患因素,这也可能导致高危个体的临床特征,即使在没有精神病发作的情况下也是如此。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e7bf/8093503/38b7cb0e240f/fnbeh-15-647069-g001.jpg

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验