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一例罕见的对印模复合材料的接触性过敏病例。

A Rare Case of Contact Allergy towards Impression Compound Material.

作者信息

Wan Ali Wan Nor Syariza, Ahmad Tarmidzi Nor Azura

机构信息

Department of Conservative Dentistry and Prosthodontics, Universiti Sains Islam Malaysia, Kuala Lumpur, Malaysia.

Department of Oral and Maxillofacial Surgery, Pathology and Medicine, Universiti Sains Islam Malaysia, Kuala Lumpur, Malaysia.

出版信息

Eur J Dent. 2021 Oct;15(4):798-801. doi: 10.1055/s-0041-1731584. Epub 2021 Aug 12.

DOI:10.1055/s-0041-1731584
PMID:34384124
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8630957/
Abstract

Impression compound has been introduced for more than 100 years. Since then, it has been widely used to obtain a preliminary impression of the edentulous arch. Although the use of impression compound has declined markedly over recent years as newer materials have become available, the cost-effectiveness and desirable physical and mechanical properties make this material indispensable in developing countries and teaching institutions. Its high viscosity characterizes impression compound as a mucocompressive impression material, which enables the full depth of the sulcus to be recorded for the retention of complete dentures. Literature reviews revealed that most contact allergies to impression materials are towards polyether, very few are towards alginate and polysulfide, and no reported cases have been found toward impression compound. This case report demonstrates a recent rare case of contact allergy towards impression compound during a routine impression taking for a fully edentulous arch in a 61-year-old woman. The patient developed symptoms of an allergic reaction, and the management of the condition was described.

摘要

印模膏已经问世100多年了。从那时起,它就被广泛用于获取无牙颌弓的初印模。尽管近年来随着新型材料的出现,印模膏的使用显著减少,但由于其成本效益以及理想的物理和机械性能,这种材料在发展中国家和教学机构中仍然不可或缺。印模膏的高粘度使其成为一种粘膜压迫性印模材料,能够记录龈沟的全深度以固定全口义齿。文献综述显示,大多数对印模材料的接触性过敏是针对聚醚的,对藻酸盐和多硫化物的过敏很少,尚未发现对印模膏过敏的报道病例。本病例报告展示了最近一例在为一名61岁女性的无牙颌弓进行常规印模制取过程中对印模膏发生接触性过敏的罕见病例。患者出现了过敏反应症状,并描述了该病症的处理情况。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/ca07460ce163/10-1055-s-0041-1731584_01346_03.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/08830272e030/10-1055-s-0041-1731584_01346_01.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/208297316b9a/10-1055-s-0041-1731584_01346_02.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/ca07460ce163/10-1055-s-0041-1731584_01346_03.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/08830272e030/10-1055-s-0041-1731584_01346_01.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/208297316b9a/10-1055-s-0041-1731584_01346_02.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ef8/8630957/ca07460ce163/10-1055-s-0041-1731584_01346_03.jpg

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