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利用高分辨率倒易空间映射对InAs/GaSb II型超晶格中的缺陷进行的研究

A Study of Defects in InAs/GaSb Type-II Superlattices Using High-Resolution Reciprocal Space Mapping.

作者信息

Sankowska Iwona, Jasik Agata, Czuba Krzysztof, Ratajczak Jacek, Kozłowski Paweł, Wzorek Marek

机构信息

Łukasiewicz Research Network-Institute of Microelectronics and Photonics, al. Lotników 32/46, 02-668 Warsaw, Poland.

出版信息

Materials (Basel). 2021 Aug 30;14(17):4940. doi: 10.3390/ma14174940.

DOI:10.3390/ma14174940
PMID:34501029
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8433902/
Abstract

In this paper, the study of defects in InAs/GaSb type-II superlattices using high-resolution an x-ray diffraction method as well as scanning (SEM) and transmission (TEM) electron microscopy is presented. The investigated superlattices had 200 (#SL200), 300 (#SL300), and 400 (#SL400) periods and were grown using molecular beam epitaxy. The growth conditions differed only in growth temperature, which was 370 °C for #SL400 and #SL200, and 390 °C for #SL300. A wings-like diffuse scattering was observed in reciprocal space maps of symmetrical (004) GaSb reflection. The micrometer-sized defect conglomerates comprised of stacking faults, and linear dislocations were revealed by the analysis of diffuse scattering intensity in combination with SEM and TEM imaging. The following defect-related parameters were obtained: (1) integrated diffuse scattering intensity of 0.1480 for #SL400, 0.1208 for #SL300, and 0.0882 for #SL200; (2) defect size: (2.5-3) μm × (2.5-3) μm -#SL400 and #SL200, (3.2-3.4) μm × (3.7-3.9) μm -#SL300; (3) defect diameter: ~1.84 μm -#SL400, ~2.45 μm -#SL300 and ~2.01 μm -#SL200; (4) defect density: 1.42 × 10 cm -#SL400, 1.01 × 10 cm -#SL300, 0.51 × 10 cm -#SL200; (5) diameter of stacking faults: 0.14 μm and 0.13 μm for #SL400 and #SL200, 0.30 μm for #SL300.

摘要

本文介绍了利用高分辨率X射线衍射方法以及扫描电子显微镜(SEM)和透射电子显微镜(TEM)对InAs/GaSb II型超晶格中的缺陷进行的研究。所研究的超晶格具有200(#SL200)、300(#SL300)和400(#SL400)个周期,采用分子束外延生长。生长条件仅在生长温度上有所不同,#SL400和#SL200的生长温度为370°C,#SL300的生长温度为390°C。在对称(004)GaSb反射的倒易空间图中观察到了翅膀状的漫散射。通过结合SEM和TEM成像对漫散射强度进行分析,揭示了由堆垛层错和线性位错组成的微米级缺陷团聚体。获得了以下与缺陷相关的参数:(1)#SL400的积分漫散射强度为0.1480,#SL300为0.1208,#SL200为0.0882;(2)缺陷尺寸:#SL400和#SL200为(2.5 - 3)μm×(2.5 - 3)μm,#SL300为(3.2 - 3.4)μm×(3.7 - 3.9)μm;(3)缺陷直径:#SL400约为1.84μm,#SL300约为2.45μm,#SL200约为2.01μm;(4)缺陷密度:#SL400为1.42×10/cm,#SL300为1.01×10/cm,#SL200为0.51×10/cm;(5)#SL400和#SL200的堆垛层错直径为0.14μm和0.13μm,#SL300为0.30μm。

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本文引用的文献

1
Structural Analysis of Highly Relaxed GaSb Grown on GaAs Substrates with Periodic Interfacial Array of 90° Misfit Dislocations.具有周期性界面 90°失配位错阵列的 GaAs 衬底上生长的弛豫 GaSb 的结构分析。
Nanoscale Res Lett. 2009 Aug 30;4(12):1458-62. doi: 10.1007/s11671-009-9420-9.
2
Effect of interfacial bonding on the structural and vibrational properties of InAs/GaSb superlattices.界面键合对InAs/GaSb超晶格结构和振动特性的影响。
Phys Rev B Condens Matter. 1996 Jun 15;53(23):15688-15705. doi: 10.1103/physrevb.53.15688.