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通过室温下优化的固体碘化法制备的高透明导电p型CuI薄膜。

Highly transparent and conductive p-type CuI films by optimized solid-iodination at room temperature.

作者信息

Luo Shulin, Xu Jing, Gong Jianhong, You Ruisong, Wang Yong, Lin Song-Sheng, Dai Ming-Jiang, Sun Hui

机构信息

School of Space Science and Physics, Shandong University, Weihai 264209, People's Republic of China.

School of Mechanical, Electrical and Information Engineering, Shandong University, Weihai 264200, People's Republic of China.

出版信息

Nanotechnology. 2021 Dec 15;33(10). doi: 10.1088/1361-6528/ac2d0a.

Abstract

p-type CuI films with optimized optoelectronic performance were synthesized by solid-phase iodination of CuN precursor films at room temperature. The effects of the deposition power of CuN precursors on the structural, electrical, and optical properties of the CuI films were systematically investigated. X-ray diffraction results show that all the CuI films possess a zinc-blende structure. When the deposition power of CuN precursors was 140 W, the CuI films present a high transmittance above 84% in the visible region, due to their smaller root-mean-square roughness values of 9.23 nm. Moreover, these films also have a low resistivity of 1.63 × 10Ω·cm and a boosted figure of merit of 140.7 MΩ. These results are significant achievements among various p-types TCOs, confirming the promising prospects of CuI as a p-type transparent semiconductor applied in transparent electronics.

摘要

通过在室温下对CuN前驱体薄膜进行固相碘化反应,合成了具有优化光电性能的p型CuI薄膜。系统研究了CuN前驱体的沉积功率对CuI薄膜的结构、电学和光学性能的影响。X射线衍射结果表明,所有CuI薄膜均具有闪锌矿结构。当CuN前驱体的沉积功率为140 W时,CuI薄膜在可见光区域呈现出高于84%的高透过率,这是由于其较小的均方根粗糙度值为9.23 nm。此外,这些薄膜还具有1.63×10Ω·cm的低电阻率和140.7 MΩ的增强品质因数。这些结果是各种p型透明导电氧化物中的重大成就,证实了CuI作为应用于透明电子器件的p型透明半导体的广阔前景。

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