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通过缺陷与掺杂工程实现的高性能耐恶劣环境氧化镓日盲光电探测器

High-Performance Harsh-Environment-Resistant GaO Solar-Blind Photodetectors via Defect and Doping Engineering.

作者信息

Hou Xiaohu, Zhao Xiaolong, Zhang Ying, Zhang Zhongfang, Liu Yan, Qin Yuan, Tan Pengju, Chen Chen, Yu Shunjie, Ding Mengfan, Xu Guangwei, Hu Qin, Long Shibing

机构信息

School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China.

Frontiers Science Center for Planetary Exploration and Emerging Technologies, University of Science and Technology of China, Hefei, 230026, China.

出版信息

Adv Mater. 2022 Jan;34(1):e2106923. doi: 10.1002/adma.202106923. Epub 2021 Oct 19.

Abstract

Gallium oxide (Ga O ), with an ultrawide bandgap, is currently regarded as one of the most promising materials for solar-blind photodetectors (SBPDs), which are greatly demanded in harsh environment, such as space exploration and flame prewarning. However, realization of high-performance SBPDs with high tolerance toward harsh environments based on low-cost Ga O material faces great challenges. Here, defect and doping (DD) engineering towards amorphous GaO (a-GaO ) has been proposed to obtain ultrasensitive SBPDs for harsh condition application. Serious oxygen deficiency and doping compensation of the engineered a-GaO film ensure the high response currents and low dark currents, respectively. Annealing item in nitrogen of DD engineering also incurs the recrystallization of material, formation of nanopores by oxygen escape, and suppression of sub-bandgap defect states. As a result, the tailored GaO SBPD based on DD engineering not only harvests a record-high responsivity rejection ratio (R /R ) of 1.8 × 10 , 10 times higher detectivity, and 2 × 10 times faster decay speed than the control device, but also keeps a high responsivity, high photo-to-dark current ratio, and sharp imaging capability even at high temperature (280 °C) or high bias (100 V). The proposed DD engineering provides an effective strategy towards highly harsh-environment-resistant GaO SBPDs.

摘要

氧化镓(Ga₂O₃)具有超宽带隙,目前被认为是日盲光电探测器(SBPD)最有前景的材料之一,这种探测器在太空探索和火焰预警等恶劣环境中有很大需求。然而,基于低成本的Ga₂O₃材料实现对恶劣环境具有高耐受性的高性能SBPD面临巨大挑战。在此,已提出对非晶Ga₂O₃(a-Ga₂O₃)进行缺陷与掺杂(DD)工程,以获得适用于恶劣条件的超灵敏SBPD。经过工程处理的a-Ga₂O₃薄膜严重的氧缺陷和掺杂补偿分别确保了高响应电流和低暗电流。DD工程在氮气中的退火处理还会引发材料的再结晶、氧逸出形成纳米孔以及抑制亚带隙缺陷态。结果,基于DD工程定制的Ga₂O₃ SBPD不仅获得了创纪录的1.8×10⁵的高响应率抑制比(R₃₅₀/R₅₅₀),探测率提高了10倍,衰减速度比对照器件快2×10²倍,而且即使在高温(280°C)或高偏压(100 V)下也能保持高响应率、高光暗电流比和清晰的成像能力。所提出的DD工程为制备高度耐恶劣环境的Ga₂O₃ SBPD提供了一种有效策略。

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