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对具有增强阱发射的SiGeSn/GeSn/SiGeSn单量子阱的研究。

Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission.

作者信息

Olorunsola Oluwatobi, Ojo Solomon, Abernathy Grey, Zhou Yiyin, Amoah Sylvester, Grant P C, Dou Wei, Margetis Joe, Tolle John, Kuchuk Andrian, Du Wei, Li Baohua, Zhang Yong-Hang, Yu Shui-Qing

机构信息

Microelectronics-Photonics Program, University of Arkansas, Fayetteville, AR 72701, United States of America.

Department of Electrical Engineering, University of Arkansas, Fayetteville, AR 72701, United States of America.

出版信息

Nanotechnology. 2021 Nov 30;33(8). doi: 10.1088/1361-6528/ac38e4.

DOI:10.1088/1361-6528/ac38e4
PMID:34763328
Abstract

In this work, a SiGeSn/GeSn/SiGeSn single quantum well was grown and characterized. The sample has a thicker GeSn well of 22nm compared to a previously reported 9nm well configuration. The thicker well leads to: (i) lowered ground energy level in Γ valley offering more bandgap directness; (ii) increased carrier density in the well; and (iii) improved carrier collection due to increased barrier height. As a result, significantly enhanced emission from the quantum well was observed. The strong photoluminescence (PL) signal allows for the estimation of quantum efficiency (QE), which was unattainable in previous studies. Using pumping-power-dependent PL spectra at 20K, the peak spontaneous QE and external QE were measured as 37.9% and 1.45%, respectively.

摘要

在这项工作中,生长并表征了一个SiGeSn/GeSn/SiGeSn单量子阱。与之前报道的9nm阱结构相比,该样品具有更厚的22nm的GeSn阱。更厚的阱导致:(i)Γ谷中的基态能级降低,提供了更高的带隙直接性;(ii)阱中载流子密度增加;以及(iii)由于势垒高度增加,载流子收集得到改善。结果,观察到量子阱的发射显著增强。强的光致发光(PL)信号使得能够估计量子效率(QE),这在以前的研究中是无法实现的。使用20K下与泵浦功率相关的PL光谱,测得峰值自发QE和外部QE分别为37.9%和1.45%。

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