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通过高温退火用完整的六方氮化硼封装提高二硒化钼和二硫化钨单层的光学质量。

Improving the Optical Quality of MoSe and WS Monolayers with Complete -BN Encapsulation by High-Temperature Annealing.

作者信息

Hua Xiang, Axenie Theodor, Goldaraz Mateo Navarro, Kang Kyungnam, Yang Eui-Hyeok, Watanabe Kenji, Taniguchi Takashi, Hone James, Kim Bumho, Herman Irving P

机构信息

Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027, United States.

Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, New Jersey 07030, United States.

出版信息

ACS Appl Mater Interfaces. 2022 Jan 12;14(1):2255-2262. doi: 10.1021/acsami.1c18991. Epub 2021 Dec 30.

Abstract

We improved the optical quality and stability of an exfoliated monolayer (ML) MoSe and chemical vapor deposition (CVD)-grown WS MLs by encapsulating and sealing them with both top and bottom few-layer -BN, as tested by subsequent high-temperature annealing up to 873 K and photoluminescence (PL) measurements. These transition-metal dichalcogenide (TMD) MLs remained stable up to this maximum temperature, as seen visually. After the heating/cooling cycle, the integrated photoluminescence (PL) intensity at 300 K in the MoSe ML was ∼4 times larger than that before heating and that from exciton and trion PL in the analogous WS ML sample was ∼14 times and ∼2.5 times larger at 77 K and the exciton peak was ∼9.5 times larger at 300 K. This is attributed to the reduction of impurities, the lateral expulsion of contamination leading to clean and atomically flat surfaces, and the sealing provided by the -BN layers that prevents the diffusion of molecules such as trace O and HO to the TMD ML. Stability and optical performance are much improved compared to that in earlier work using top -BN only, in which the WS ML PL intensity decreased even for an optimal gas environment. This complete encapsulation is particularly promising for CVD-grown TMD MLs because they have relatively more charge and other impurities than do exfoliated MLs. These results open a new route for improving the optical properties of TMD MLs and their performance and applications both at room and higher temperatures.

摘要

我们通过用上下几层 -BN 对剥离的单层(ML)MoSe 和化学气相沉积(CVD)生长的 WS ML 进行封装和密封,提高了它们的光学质量和稳定性,这通过高达 873 K 的后续高温退火和光致发光(PL)测量进行了测试。这些过渡金属二硫属化物(TMD)ML 在这个最高温度下保持稳定,肉眼可见。在加热/冷却循环后,MoSe ML 在 300 K 时的积分光致发光(PL)强度比加热前大约 4 倍,类似的 WS ML 样品中激子和三重子 PL 在 77 K 时分别大约大 14 倍和 2.5 倍,激子峰在 300 K 时大约大 9.5 倍。这归因于杂质的减少、污染物的横向排出导致清洁且原子级平整的表面,以及 -BN 层提供的密封,防止诸如痕量 O 和 HO 等分子扩散到 TMD ML。与仅使用顶部 -BN 的早期工作相比,稳定性和光学性能有了很大提高,在早期工作中,即使在最佳气体环境下,WS ML 的 PL 强度也会降低。这种完全封装对于 CVD 生长的 TMD ML 特别有前景,因为它们比剥离的 ML 具有相对更多的电荷和其他杂质。这些结果为改善 TMD ML 在室温和更高温度下的光学性质及其性能和应用开辟了一条新途径。

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