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通过分子表面电荷转移掺杂实现单层和多层二硫化钼中的金属性传输

Metallic Transport in Monolayer and Multilayer Molybdenum Disulfides by Molecular Surface Charge Transfer Doping.

作者信息

Matsuyama Keigo, Aoki Ryuya, Miura Kohei, Fukui Akito, Togawa Yoshihiko, Yoshimura Takeshi, Fujimura Norifumi, Kiriya Daisuke

机构信息

Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai-shi, Osaka 599-8531, Japan.

出版信息

ACS Appl Mater Interfaces. 2022 Feb 16;14(6):8163-8170. doi: 10.1021/acsami.1c22156. Epub 2022 Feb 2.

DOI:10.1021/acsami.1c22156
PMID:35107263
Abstract

Carrier modulation in transition-metal dichalcogenides (TMDCs) is of importance for applying electronic devices to tune their transport properties and controlling phases, including metallic to superconductivity. Although the surface charge transfer doping method has shown a strong modulation ability of the electronic structures in TMDCs and a degenerately doped state has been proposed, the details of the electronic states have not been elucidated, and this transport behavior should show a considerable thickness dependence in TMDCs. In this study, we characterize the metallic transport behavior in the monolayer and multilayer MoS under surface charge transfer doping with a strong electron dopant, benzyl viologen (BV) molecules. The metallic behavior transforms to an insulative state under a negative gate voltage. Consequently, metal-insulator transition (MIT) was observed in both monolayer and multilayer MoS correlating with the critical conductivity of order /. In the multilayer case, the BV molecules strongly modulated the topmost surface layer in the bulk MoS; the transfer characteristics suggested a crossover from a heterogeneously doped state with a doped topmost layer to doping in the deep layers caused by the variation in the gate voltage. The findings of this work will be useful for understanding the device characteristics of thin-layered materials and for applying them to the controlling phases via carrier modulation.

摘要

过渡金属二硫属化物(TMDCs)中的载流子调制对于应用电子器件来调节其输运性质和控制相(包括从金属相到超导相)具有重要意义。尽管表面电荷转移掺杂方法已显示出对TMDCs电子结构的强大调制能力,并已提出简并掺杂状态,但电子态的细节尚未阐明,并且这种输运行为在TMDCs中应表现出相当大的厚度依赖性。在本研究中,我们用强电子掺杂剂苄基紫精(BV)分子对单层和多层MoS在表面电荷转移掺杂下的金属输运行为进行了表征。在负栅极电压下,金属行为转变为绝缘状态。因此,在单层和多层MoS中均观察到与/量级的临界电导率相关的金属-绝缘体转变(MIT)。在多层情况下,BV分子强烈调制了体相MoS的最顶层;转移特性表明,随着栅极电压的变化,从具有掺杂最顶层的非均匀掺杂状态转变为深层掺杂。这项工作的发现将有助于理解薄层材料的器件特性,并通过载流子调制将其应用于控制相。

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