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III-Sb 纳米线的最新进展:从合成到应用。

Recent advances in III-Sb nanowires: from synthesis to applications.

机构信息

Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong Special Administrative Region of China, People's Republic of China. Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, People's Republic of China.

出版信息

Nanotechnology. 2019 May 17;30(20):202003. doi: 10.1088/1361-6528/aafcce. Epub 2019 Jan 9.

Abstract

The excellent properties of III-V semiconductors make them intriguing candidates for next-generation electronics and optoelectronics. Their nanowire (NW) counterparts further provide interesting geometry and a quantum confinement effect which benefits various applications. Among the many members of all the III-V semiconductors, III-antimonide NWs have attracted significant research interest due to their narrow, direct bandgap and high carrier mobility. However, due to the difficulty of NW fabrication, the development of III-antimonide NWs and their corresponding applications are always a step behind the other III-V semiconductors. Until recent years, because of advances in understanding and fabrication techniques, electronic and optoelectronic devices based on III-antimonide NWs with novel performance have been fabricated. In this review, we will focus on the development of the synthesis of III-antimonide NWs using different techniques and strategies for fine-tuning the crystal structure and composition as well as fabricating their corresponding heterostructures. With such development, the recent progress in the applications of III-antimonide NWs in electronics and optoelectronics is also surveyed. All these discussions provide valuable guidelines for the design of III-antimonide NWs for next-generation device utilization.

摘要

III-V 族半导体的优异性质使它们成为下一代电子学和光电子学的极具吸引力的候选材料。它们的纳米线 (NW) 对应物进一步提供了有趣的几何形状和量子限制效应,这有利于各种应用。在所有 III-V 半导体中,III-锑化物 NW 由于其狭窄的直接带隙和高载流子迁移率而引起了极大的研究兴趣。然而,由于 NW 制造的困难,III-锑化物 NW 的发展及其相应的应用总是落后于其他 III-V 半导体。直到最近几年,由于对理解和制造技术的进步,基于具有新型性能的 III-锑化物 NW 的电子和光电子器件已经被制造出来。在这篇综述中,我们将重点介绍使用不同技术和策略合成 III-锑化物 NW 的发展情况,这些技术和策略可用于微调晶体结构和组成,并制造相应的异质结构。随着这一发展,还调查了 III-锑化物 NW 在电子学和光电子学中的应用的最新进展。所有这些讨论为下一代器件应用的 III-锑化物 NW 的设计提供了有价值的指导。

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