Mo Guowei, Cui Yunxian, Yin Junwei, Gao Pengfei
Mechanical and Electronic Engineering, College of Mechanical Engineering, Dalian Jiaotong University, Dalian 116024, China.
Department of Mechanical Engineering, Liaoning Machinery Electricity Vocational Technical College, Dandong 118000, China.
Micromachines (Basel). 2022 Apr 18;13(4):639. doi: 10.3390/mi13040639.
ZnO film is widely used in the field of health monitoring sensors, which has high requirements for the piezoelectric coefficient and film-to-substrate adhesion of the ZnO film. In this study, ZnO thin films were grown on a GH4169 superalloy steel (GSS) substrate using magnetron sputtering, and the effects of the sputtering power, argon-oxygen ratio, and sputtering pressure on the piezoelectric coefficient and film-to-substrate adhesion were studied. The composition, microstructure, and crystal orientation of ZnO thin films deposited under different process parameters were analyzed using X-ray diffraction (XRD), a scanning electron microscope (SEM), and an energy spectrum analyzer (EDS). The piezoelectric coefficient d was measured using a piezoelectric coefficient measuring instrument. The critical value of adhesion between the film and substrate was measured using the scratch method. The results demonstrated that the ZnO films had the most desirable properties when the sputtering power was 150 W, the argon-oxygen ratio was 25:10, and the sputtering pressure was 0.7 Pa. The XRD results showed that the ZnO film samples had the strongest (002) crystal orientation at 2θ = 34.4°; the SEM photos showed that the film samples were flat and uniform; and the EDS composition analysis results showed that the composition was close to the theoretical value. The maximum coefficient value was 5.12 pC/N, and the maximum value of film-to-substrate adhesion between the ZnO films and GSS substrate was 4220 mN.
氧化锌薄膜在健康监测传感器领域有着广泛应用，这对氧化锌薄膜的压电系数和膜与衬底的附着力有很高要求。在本研究中，采用磁控溅射在GH4169高温合金钢（GSS）衬底上生长氧化锌薄膜，并研究了溅射功率、氩氧比和溅射压力对压电系数及膜与衬底附着力的影响。利用X射线衍射（XRD）、扫描电子显微镜（SEM）和能谱分析仪（EDS）分析了在不同工艺参数下沉积的氧化锌薄膜的成分、微观结构和晶体取向。使用压电系数测量仪测量压电系数d。采用划痕法测量薄膜与衬底之间附着力的临界值。结果表明，当溅射功率为150W、氩氧比为25:10、溅射压力为0.7Pa时，氧化锌薄膜具有最理想的性能。XRD结果表明，氧化锌薄膜样品在2θ = 34.4°时（002）晶体取向最强；SEM照片显示薄膜样品平整均匀；EDS成分分析结果表明成分接近理论值。最大系数值为5.12pC/N，氧化锌薄膜与GSS衬底之间的膜与衬底附着力最大值为4220mN。
