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通过双光子光刻制造的聚合物纳米线的拉伸性能。

Tensile properties of polymer nanowires fabricated two-photon lithography.

作者信息

Ladner Ian S, Cullinan Michael A, Saha Sourabh K

机构信息

Center for Engineered Materials & Manufacturing, Lawrence Livermore National Laboratory 7000 East Avenue Livermore CA 94550 USA.

Department of Mechanical Engineering, The University of Texas at Austin 204 E. Dean Keeton Street Austin TX 78712 USA

出版信息

RSC Adv. 2019 Sep 13;9(49):28808-28813. doi: 10.1039/c9ra02350j. eCollection 2019 Sep 9.

DOI:10.1039/c9ra02350j
PMID:35529657
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9071184/
Abstract

Two-photon lithography enables fabrication of complex 3D structures with nanoscale features. However, its utility is limited by the lack of knowledge about the process-property relationship. Here, we have designed micro-electro-mechanical systems (MEMS)-based miniaturized tensile testers to measure the stress-strain response of the individual polymer nanowires. Measurements demonstrate that geometrically indistinguishable nanowires can exhibit widely varying material behavior ranging from brittle to soft plastic based on processing conditions. In addition, a distinct size-scaling effect was observed for post-processed nanowires wherein thinner nanowires have up to 2 times higher properties. The process-property characterization presented here will be critical for predictive design of functional 3D structures with nanoscale features.

摘要

双光子光刻技术能够制造具有纳米级特征的复杂三维结构。然而,由于缺乏对工艺-性能关系的了解,其应用受到限制。在此,我们设计了基于微机电系统(MEMS)的小型化拉伸测试仪,以测量单个聚合物纳米线的应力-应变响应。测量结果表明,基于加工条件,几何上难以区分的纳米线可呈现出从脆性到软塑性的广泛不同的材料行为。此外,对于后处理的纳米线,观察到了明显的尺寸缩放效应,其中较细的纳米线性能高达两倍。本文所呈现的工艺-性能表征对于具有纳米级特征的功能性三维结构的预测设计至关重要。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/2f2369751ffd/c9ra02350j-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/161ccb3406f9/c9ra02350j-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/4cef627e810a/c9ra02350j-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/48ee873ac548/c9ra02350j-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/2f2369751ffd/c9ra02350j-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/161ccb3406f9/c9ra02350j-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/4cef627e810a/c9ra02350j-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/48ee873ac548/c9ra02350j-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/91ea/9071184/2f2369751ffd/c9ra02350j-f4.jpg

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