Fan Lele, Wang Xiangqi, Wang Feng, Zhang Qinfang, Zhu Lei, Meng Qiangqiang, Wang Baolin, Zhang Zengming, Zou Chongwen
Key Laboratory for Advanced Technology in Environmental Protection of Jiangsu Province, Yancheng Institute of Technology Yancheng 224051 P. R. China
National Synchrotron Radiation Laboratory, University of Science and Technology of China Hefei 230029 P. R. China
RSC Adv. 2018 May 24;8(34):19151-19156. doi: 10.1039/c8ra03292k. eCollection 2018 May 22.
Vanadium dioxide (VO) material shows a distinct metal-insulator transition (MIT) at the critical temperature of ∼340 K. Similar to other correlated oxides, the MIT properties of VO is always sensitive to those crystal defects such as oxygen vacancies. In this study, we investigated the oxygen vacancies related phase transition behavior of VO crystal film and systematically examined the effect of oxygen vacancies from the optical constant measurements. The results indicated that the oxygen vacancies changed not only the electron occupancy on V 3d-O 2p hybrid-orbitals, but also the electron-electron correlation energy and the related band gap, which modulated the MIT behavior and decreased the critical temperature resultantly. Our work not only provided a facile way to modulate the MIT behavior of VO crystal film, but also revealed the effects of the oxygen vacancies on the electronic inter-band transitions as well as the electronic correlations in driving this MIT process.
二氧化钒(VO)材料在约340K的临界温度下呈现出明显的金属-绝缘体转变(MIT)。与其他关联氧化物类似,VO的MIT特性总是对诸如氧空位等晶体缺陷敏感。在本研究中,我们研究了VO晶体薄膜与氧空位相关的相变行为,并通过光学常数测量系统地研究了氧空位的影响。结果表明,氧空位不仅改变了V 3d-O 2p杂化轨道上的电子占据情况,还改变了电子-电子关联能以及相关的带隙,从而调节了MIT行为并最终降低了临界温度。我们的工作不仅提供了一种调节VO晶体薄膜MIT行为的简便方法,还揭示了氧空位对电子带间跃迁以及驱动该MIT过程中的电子关联的影响。