从基于二氯甲烷的电解质中电沉积锡纳米线。
Electrodeposition of tin nanowires from a dichloromethane based electrolyte.
作者信息
Lodge Andrew W, Hasan Mahboba M, Bartlett Philip N, Beanland Richard, Hector Andrew L, Kashtiban Reza J, Levason William, Reid Gillian, Sloan Jeremy, Smith David C, Zhang Wenjian
机构信息
Chemistry, University of Southampton, Highfield Southampton SO17 1BJ UK
Department of Physics, University of Warwick Coventry CV4 7AL UK.
出版信息
RSC Adv. 2018 Jul 2;8(42):24013-24020. doi: 10.1039/c8ra03183e. eCollection 2018 Jun 27.
Tin was electrodeposited from a dichloromethane-based electrolyte at ambient temperature into gold coated anodic alumina membranes with nanoscale pores. The tin nanowires are mainly 〈200〉 aligned, together with some 〈101〉 and 〈301〉 wires. Partial filling of the structure and a distribution of wire lengths was found. Grafting of the pores with hydrophobic surface groups was trialled as a means of modifying the deposition, however, it did not increase the proportion of pores in which wires grew. Under potentiostatic conditions the limited rates of nucleation and diffusion down the 1D pores control the growth of the nanowires.
在室温下，锡从基于二氯甲烷的电解质中电沉积到具有纳米级孔隙的镀金阳极氧化铝膜中。锡纳米线主要沿〈200〉方向排列，同时还有一些〈101〉和〈301〉方向的纳米线。发现结构存在部分填充以及纳米线长度分布情况。尝试用疏水表面基团接枝孔隙作为一种改变沉积的方法，然而，这并没有增加有纳米线生长的孔隙比例。在恒电位条件下，一维孔隙中有限的成核速率和扩散速率控制着纳米线的生长。
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