Bartlett Philip N, de Groot C H Kees, Greenacre Victoria K, Huang Ruomeng, Noori Yasir J, Reid Gillian, Thomas Shibin
School of Chemistry, University of Southampton, Southampton, UK.
School of Electronics and Computer Science, University of Southampton, Southampton, UK.
Nat Rev Chem. 2025 Feb;9(2):88-101. doi: 10.1038/s41570-024-00671-6. Epub 2025 Jan 8.
Two-dimensional transition metal dichalcogenides (TMDCs) are highly anisotropic, layered semiconductors, with the general formula ME (M = metal, E = sulfur, selenium or tellurium). Much current research in this field focusses on TMDCs for catalysis and energy applications; they are also attracting great interest for next-generation transistor and optoelectronic devices. The latter high-tech applications place stringent requirements on the stoichiometry, crystallinity, morphology and electronic properties of monolayer and few-layer materials. As a solution-based process, wherein the material grows specifically on the electrode surface, electrodeposition offers great promise as a readily scalable, area-selective growth process. This Review explores the state-of-the-art for TMDC electrodeposition, highlighting how the choice of precursor (or precursors), solvent and electrode designs, with novel 'device-ready' electrode geometries, influence their morphologies and properties, thus enabling the direct growth of ultrathin, highly anisotropic 2D TMDCs and much scope for future advances.
二维过渡金属二硫属化物（TMDCs）是高度各向异性的层状半导体，通式为ME（M = 金属，E = 硫、硒或碲）。该领域目前的许多研究集中于用于催化和能源应用的TMDCs；它们也引起了下一代晶体管和光电器件的极大兴趣。后一类高科技应用对单层和少层材料的化学计量、结晶度、形态和电子性质提出了严格要求。作为一种基于溶液的工艺，材料在电极表面特异性生长，电沉积作为一种易于扩展的区域选择性生长工艺具有很大前景。本综述探讨了TMDC电沉积的最新进展，强调了前驱体（或多种前驱体）、溶剂和电极设计的选择，以及新颖的“适用于器件的”电极几何形状如何影响其形态和性质，从而实现超薄、高度各向异性的二维TMDCs的直接生长以及未来进一步发展的广阔空间。
