Hariwal Rajesh V, Malik Hitendra K, Negi Ambika, Kandasami Asokan
Inter-University Accelerator Centre Aruna Asaf Ali Marg New Delhi - 110067 India
Department of Physics, Indian Institute of Technology Delhi New Delhi-110016 India.
RSC Adv. 2018 Feb 6;8(12):6278-6287. doi: 10.1039/c7ra10615g.
The defects in the host lattice play a major role in tuning the surface roughness, optical band gap and the room temperature ferromagnetism (RTFM) of ZnO thin films. Herein, we report a novel approach to tailor the band gap and RTFM of a ZnO nanostructure by varying the angle of implantation of 60 keV N ions keeping the ion fluence of 1 × 10 ions per cm and the beam size of 3 mm constant. The implantation was performed by changing the thin films' orientations at 30°, 60° and 90° with respect to the incident beams. Remarkably, an enhancement of ∼6 times in RTFM, tuning in band gap from 3.27 to 3.21 eV and ∼60% reduction in surface roughness were noticed when the ion implantation was done at 60° to the normal. This novel technique may be suitable for tuning the physical properties of nanostructures for their application in the spintronics, semiconductor and solar cell industries.
基质晶格中的缺陷在调节ZnO薄膜的表面粗糙度、光学带隙和室温铁磁性(RTFM)方面起着主要作用。在此,我们报告了一种新颖的方法,通过改变60 keV N离子的注入角度来调整ZnO纳米结构的带隙和RTFM,同时保持离子通量为每平方厘米1×10离子且束斑尺寸为3 mm不变。通过相对于入射束将薄膜取向改变为30°、60°和90°来进行注入。值得注意的是,当离子垂直入射方向以60°进行注入时,观察到RTFM增强了约6倍,带隙从3.27 eV调谐到3.21 eV,并且表面粗糙度降低了约60%。这种新技术可能适用于调节纳米结构的物理性质,以用于自旋电子学、半导体和太阳能电池行业。