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基于自组装单分子层(SAM)的隧道结中底部电极诱导的缺陷仅影响SAM电阻,而不影响接触电阻或SAM电容。

Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance.

作者信息

Sangeeth C S Suchand, Jiang Li, Nijhuis Christian A

机构信息

Department of Chemistry, National University of Singapore 3 Science Drive 3 Singapore 117543 Singapore

Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore 6 Science Drive 2 Singapore 117546 Singapore.

出版信息

RSC Adv. 2018 May 30;8(36):19939-19949. doi: 10.1039/c8ra01513a.

DOI:10.1039/c8ra01513a
PMID:35541643
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9080736/
Abstract

In large area molecular junctions, defects are always present and can be caused by impurities and/or defects in the electrode materials and/or SAMs, but how they affect the electrical characteristics of junctions has rarely been studied. Usually, junctions are characterized by two-terminal current-voltage measurements where only the total current across the junction is measured, but with these methods one cannot distinguish how the individual components of the junctions are altered by the defects. Here we show that the roughness of the bottom-electrode is a crucial factor in determining the electrical properties of self-assembled monolayer (SAM)-based junctions. We used potentiodynamic impedance spectroscopy to reveal which components of the junctions are altered by defective bottom electrodes because this method allows for direct determination of all components that impede charge transport in the equivalent circuit of the junctions. We intentionally introduced defects the roughness of the bottom electrode and found that these defects lower the SAM resistance but they do not alter the capacitance of the SAM or the contact resistance of the junction. In other words, defective junctions can be seen as "leaky capacitors" resulting in an underestimation of the SAM resistance of two orders of magnitude. These results help to improve the interpretation of data generated by SAM-based junctions and explain in part the observed large spread of reported tunneling rates for the same molecules measured across different platforms.

摘要

在大面积分子结中,缺陷总是存在的,可能由电极材料和/或自组装单分子层(SAM)中的杂质和/或缺陷引起,但它们如何影响结的电学特性却鲜有研究。通常,结通过两终端电流 - 电压测量来表征,其中仅测量通过结的总电流,但使用这些方法无法区分结的各个组件是如何被缺陷改变的。在此我们表明,底部电极的粗糙度是决定基于自组装单分子层(SAM)的结的电学性质的关键因素。我们使用动电位阻抗谱来揭示底部电极缺陷会改变结的哪些组件,因为这种方法允许直接确定在结的等效电路中阻碍电荷传输的所有组件。我们故意引入底部电极粗糙度的缺陷,发现这些缺陷会降低SAM电阻,但不会改变SAM的电容或结的接触电阻。换句话说,有缺陷的结可被视为“漏电电容器”,导致SAM电阻被低估两个数量级。这些结果有助于改进对基于SAM的结所产生数据的解释,并部分解释了在不同平台上测量同一分子时观察到的隧穿速率的巨大差异。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/833b956c1e8c/c8ra01513a-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/31770095ad8a/c8ra01513a-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/63fb9a1251cb/c8ra01513a-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/5acac6a21881/c8ra01513a-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/b86498fcf11e/c8ra01513a-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/d30fa91b45e9/c8ra01513a-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/833b956c1e8c/c8ra01513a-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/31770095ad8a/c8ra01513a-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/63fb9a1251cb/c8ra01513a-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/5acac6a21881/c8ra01513a-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/b86498fcf11e/c8ra01513a-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/d30fa91b45e9/c8ra01513a-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ade7/9080736/833b956c1e8c/c8ra01513a-f6.jpg

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