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InGaN/GaN纳米线异质结构中应变分配与弛豫的高分辨率映射

High-Resolution Mapping of Strain Partitioning and Relaxation in InGaN/GaN Nanowire Heterostructures.

作者信息

Park Bumsu, Lee Ja Kyung, Koch Christoph T, Wölz Martin, Geelhaar Lutz, Oh Sang Ho

机构信息

Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea.

CEMES-CNRS, 29 rue J. Marvig, Toulouse, 31 055, France.

出版信息

Adv Sci (Weinh). 2022 Aug;9(22):e2200323. doi: 10.1002/advs.202200323. Epub 2022 Jun 5.

DOI:10.1002/advs.202200323
PMID:35665488
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9353496/
Abstract

Growing an In Ga N/GaN (InGaN/GaN) multi-quantum well (MQW) heterostructure in nanowire (NW) form is expected to overcome limitations inherent in light-emitting diodes (LEDs) based on the conventional planar heterostructure. The epitaxial strain induced in InGaN/GaN MQW heterostructure can be relaxed through the sidewalls of NW, which is beneficial to LEDs because a much larger misfit strain with higher indium concentration can be accommodated with reduced piezoelectric polarization fields. The strain relaxation, however, renders highly complex strain distribution within the NW heterostructure. Here the authors show that complementary strain mapping using scanning transmission electron microscopy and dark-field inline holography can comprehend the strain distribution within the axial In Ga N/GaN MQW heterostructure embedded in GaN NW by providing the strain maps which can cover the entire NW and fine details near the sidewalls. With the quantitative evaluation by 3D finite element modelling, it is confirmed that the observed complex strain distribution is induced by the strain relaxation leading to the strain partitioning between InGaN quantum disk, GaN quantum well, and the surrounding epitaxial GaN shell. The authors further show that the strain maps provide the strain tensor components which are crucial for accurate assessment of the strain-induced piezoelectric fields in NW LEDs.

摘要

以纳米线(NW)形式生长铟镓氮/氮化镓(InGaN/GaN)多量子阱(MQW)异质结构有望克服基于传统平面异质结构的发光二极管(LED)所固有的局限性。InGaN/GaN MQW异质结构中产生的外延应变可以通过NW的侧壁得到弛豫,这对LED是有益的,因为可以在降低压电极化场的情况下容纳更大的失配应变以及更高的铟浓度。然而,应变弛豫会使NW异质结构内的应变分布变得高度复杂。在此,作者表明,通过扫描透射电子显微镜和暗场在线全息术进行的互补应变映射,能够通过提供覆盖整个NW以及侧壁附近精细细节的应变图,来理解嵌入在GaN NW中的轴向InGaN/GaN MQW异质结构内的应变分布。通过三维有限元建模进行定量评估,证实了所观察到的复杂应变分布是由应变弛豫引起的,导致应变在InGaN量子盘、GaN量子阱以及周围的外延GaN壳层之间进行分配。作者进一步表明,应变图提供了应变张量分量,这对于准确评估NW LED中应变诱导的压电极化场至关重要。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/b775ba319cf7/ADVS-9-2200323-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/f4b717fa614d/ADVS-9-2200323-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/939d852650b2/ADVS-9-2200323-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/6752da45c93f/ADVS-9-2200323-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/f8fb29913629/ADVS-9-2200323-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/b0f51694d901/ADVS-9-2200323-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/b775ba319cf7/ADVS-9-2200323-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/f4b717fa614d/ADVS-9-2200323-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/939d852650b2/ADVS-9-2200323-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/6752da45c93f/ADVS-9-2200323-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/f8fb29913629/ADVS-9-2200323-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/b0f51694d901/ADVS-9-2200323-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8abb/9353496/b775ba319cf7/ADVS-9-2200323-g005.jpg

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