Wei Weiqin, Wei Zhen, Li Ruizhe, Li Zhenhua, Shi Run, Ouyang Shuxin, Qi Yuhang, Philips David Lee, Yuan Hong
Key Laboratory of Pesticide and Chemical Biology of Ministry of Education, College of Chemistry, Central China Normal University, Wuhan, 430079, China.
Department of Chemistry, University of Hong Kong, Pokfulam Road, Hong Kong SAR, China.
Nat Commun. 2022 Jun 9;13(1):3199. doi: 10.1038/s41467-022-30958-5.
Oxygen defects play an important role in many catalytic reactions. Increasing surface oxygen defects can be done through reduction treatment. However, excessive reduction blocks electron channels and deactivates the catalyst surface due to electron-trapped effects by subsurface oxygen defects. How to effectively extract electrons from subsurface oxygen defects which cannot directly interact with reactants is challenging and remains elusive. Here, we report a metallic In-embedded InO nanoflake catalyst over which the turnover frequency of CO reduction into CO increases by a factor of 866 (7615 h) and 376 (2990 h) at the same light intensity and reaction temperature, respectively, compared to InO. Under electron-delocalization effect of O-In-(O)V-In-In structural units at the interface, the electrons in the subsurface oxygen defects are extracted and gather at surface active sites. This improves the electronic coupling with CO and stabilizes intermediate. The study opens up new insights for exquisite electronic manipulation of oxygen defects.
氧缺陷在许多催化反应中起着重要作用。通过还原处理可以增加表面氧缺陷。然而,过度还原会阻塞电子通道,并由于亚表面氧缺陷的电子俘获效应而使催化剂表面失活。如何有效地从不能直接与反应物相互作用的亚表面氧缺陷中提取电子具有挑战性,并且仍然难以捉摸。在此,我们报道了一种嵌入金属铟的氧化铟纳米片催化剂,在相同的光强度和反应温度下,与氧化铟相比,该催化剂将一氧化碳还原为二氧化碳的周转频率分别提高了866倍(7615 h⁻¹)和376倍(2990 h⁻¹)。在界面处的O-In-(O)V-In-In结构单元的电子离域效应下,亚表面氧缺陷中的电子被提取并聚集在表面活性位点上。这改善了与一氧化碳的电子耦合并稳定了中间体。该研究为精确电子操纵氧缺陷开辟了新的见解。