Li A, Hauge H I T, Verheijen M A, Bakkers E P A M, Tucker R T, Vincent L, Renard C
Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands.
Eurofins Materials Science, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands.
Nanotechnology. 2022 Oct 12;34(1). doi: 10.1088/1361-6528/ac9317.
Hexagonal SiGe-2H has been recently shown to have a direct bandgap, and holds the promise to be compatible with silicon technology. Hexagonal Si and Ge have been grown on an epitaxial lattice matched template consisting of wurtzite GaP and GaAs, respectively. Here, we present the growth of hexagonal Si and SiGe nanowire branches grown from a wurtzite stem by the vapor-liquid-solid growth mode, which is substantiated bytransmission electron microscopy. We show that the composition can be tuned through the whole range of stoichiometry from Si to Ge, and the possibility to realize Si and SiGe heterostructures in these branches.
最近研究表明,六方相SiGe - 2H具有直接带隙,有望与硅技术兼容。六方相Si和Ge已分别生长在由纤锌矿GaP和GaAs组成的外延晶格匹配模板上。在此,我们展示了通过气-液-固生长模式从纤锌矿主干生长出的六方相Si和SiGe纳米线分支,这一点通过透射电子显微镜得到了证实。我们表明,其成分可以在从Si到Ge的整个化学计量范围内进行调节,并且有可能在这些分支中实现Si和SiGe异质结构。