Elangovan Thangavel, Balasankar Athinarayanan, Arokiyaraj Selvaraj, Rajagopalan Ramaseshan, George Rani P, Oh Tae Hwan, Kuppusami Parasuraman, Ramasundaram Subramaniyan
Smart Energy Materials Research Lab (SEMRL), Department of Energy Science, Periyar University, Salem 636011, India.
Department of Physics, Gobi Arts & Science College, Gobichettipalayam 638476, India.
Micromachines (Basel). 2022 Aug 27;13(9):1411. doi: 10.3390/mi13091411.
Highly durable and antimicrobial tantalum nitride/copper (TaN/Cu) nanocomposite coatings were deposited on D-9 stainless steel substrates by pulsed magnetron sputtering. The Cu content in the coating was varied in the range of 1.42-35.42 atomic % (at.%). The coatings were characterized by electron probe microanalyzer, X-ray diffraction, scanning electron microscope and atomic force microscope. The antibacterial properties of the TaN/Cu coatings against gram-negative were evaluated using a cell culture test. The peak hardness and Young's modulus of TaN/Cu with 10.46 at.% Cu were 24 and 295 GPa, respectively, which amounted to 15 and 41.67% higher than Cu-free TaN. Among all, TaN/Cu with 10.46 at.% exhibited the lowest friction coefficient. The TaN/Cu coatings exhibited significantly higher antibacterial activity than Cu-free TaN against . On TaN, the bacterial count was about 4 × 10 CFU, whereas it was dropped to 1.2 × 10 CFU in case of TaN/Cu with 10.46 at.% Cu. The bacterial count was decreased from 9 to 6 when the Cu content increased from 25.54 to 30.04 at.%. Live bacterial cells were observed in the SEM images of TaN, and dead cells were found on TaN/Cu. Overall, TaN/Cu with 10.46 at.% Cu was found to be a potential coating composition in terms of higher antimicrobial activity and mechanical durability.
通过脉冲磁控溅射在D-9不锈钢基底上沉积了具有高耐久性和抗菌性的氮化钽/铜(TaN/Cu)纳米复合涂层。涂层中的铜含量在1.42-35.42原子百分比(at.%)范围内变化。通过电子探针微分析仪、X射线衍射、扫描电子显微镜和原子力显微镜对涂层进行了表征。使用细胞培养试验评估了TaN/Cu涂层对革兰氏阴性菌的抗菌性能。含10.46 at.%铜的TaN/Cu的峰值硬度和杨氏模量分别为24 GPa和295 GPa,比不含铜的TaN分别高出15%和41.67%。其中,含10.46 at.%铜的TaN/Cu表现出最低的摩擦系数。TaN/Cu涂层对[具体革兰氏阴性菌名称未给出]的抗菌活性明显高于不含铜的TaN。在TaN上,细菌计数约为4×10 CFU,而在含10.46 at.%铜的TaN/Cu情况下,细菌计数降至1.2×10 CFU。当铜含量从25.5৪ at.%增加到30.04 at.%时,细菌计数从9降至6。在TaN的扫描电子显微镜图像中观察到活细菌细胞,而在TaN/Cu上发现了死细胞。总体而言,含10.46 at.%铜的TaN/Cu在更高的抗菌活性和机械耐久性方面被认为是一种潜在的涂层成分。