Zhang Baolin, Meng Lingkuan, Li Zili
School of Information Science and Technology, Fudan University Shanghai 200433 China
Beijing Institute of Carbon-based Integrated Circuit Yiyuan Cultural and Creative Industry Park, 80 Xingshikou Road, Haidian District Beijing 100089 China.
RSC Adv. 2022 Oct 5;12(44):28376-28387. doi: 10.1039/d2ra04803e. eCollection 2022 Oct 4.
With the development of frontier technology in emerging semiconductor processes, self-assembling (SA) and directed self-assembly (DSA) of block copolymers (BCPs) have attracted great attention from scientific researchers and become promising candidates for advanced photolithography. Using an optimal coating and baking process, highly ordered assembly morphologies (, cylinder and lamella) of two BCPs in thin films were obtained without an additional topcoat material layer. Moreover, the whole experimental study also provides an optimal process for integrating the two BCPs into the same topographic guiding pattern substrate fabricated by electron beam lithography (EBL) to achieve specific self-assembly. This topographic guiding substrate achieves not only lamellar micro-domains aligned perpendicular to the sidewalls of trench edges but also cylindrical micro-domains (PMMA phase in a PS matrix) aligned parallel to trench edges respectively, which provides insights and valuable information for further applications in lithography and electronic devices.
随着新兴半导体工艺中前沿技术的发展，嵌段共聚物（BCP）的自组装（SA）和定向自组装（DSA）引起了科研人员的极大关注，并成为先进光刻技术的有前途的候选方案。通过优化的涂覆和烘烤工艺，在不添加额外顶涂层材料层的情况下，获得了薄膜中两种BCP的高度有序组装形态（圆柱体和片层）。此外，整个实验研究还提供了一种优化工艺，可将两种BCP整合到通过电子束光刻（EBL）制造的同一地形引导图案基板中，以实现特定的自组装。这种地形引导基板不仅实现了垂直于沟槽边缘侧壁排列的片层微区，还分别实现了平行于沟槽边缘排列的圆柱形微区（PS基质中的PMMA相），这为光刻和电子器件的进一步应用提供了见解和有价值的信息。
